⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8036382 | 0.79 | TSHR (0.52) | — | |
| SCHEMBL253402 | 0.76 | — | — | |
| SCHEMBL8034620 | 0.76 | TSHR (0.48) | — | |
| SCHEMBL9450242 | 0.76 | TSHR (0.48) | — | |
| SCHEMBL330934 | 0.72 | — | — | |
| SCHEMBL20082956 | 0.71 | TSHR (0.33) | — | |
| SCHEMBL4573421 | 0.71 | ALDH1A1 (0.38) | — | |
| SCHEMBL17035614 | 0.71 | TSHR (0.40) | — | |
| SCHEMBL15068262 | 0.71 | TSHR (0.40) | — | |
| Acrylic Acid Ethyl Ester SCHEMBL10938255 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113185533-A | Synthetic method of key intermediate of Prifloxacin | 浙江工业大学 | 2021-07-30 | — | — | CN | disclosed |
| CN-106459303-A | Curable composition and photochromic composition | 株式会社德山 | 2017-02-22 | — | — | CN | disclosed |
| CN-101104704-B | Composition curable with actinic energy ray and use thereof | NATOCO CO LTD | 2013-04-17 | — | — | CN | disclosed |
| CN-101889036-B | Photochromic curable composition | TOKUYAMA CORPROATION | 2013-01-02 | — | — | CN | disclosed |
| CN-102834416-A | Substituted cyclodextrin derivatives useful as intermediates for producing biologically active materials | ARCARIOS BV | 2012-12-19 | — | — | CN | disclosed |
| CN-101889036-A | Photochromic curable composition | TOKUYAMA CORP | 2010-11-17 | — | — | CN | disclosed |
| CN-101104724-B | Composition curable with actinic energy ray and use thereof | NATOCO CO LTD | 2010-09-08 | — | — | CN | disclosed |
| CN-101104670-B | Composition curable with actinic energy ray and use thereof | NATOCO CO LTD | 2010-07-21 | — | — | CN | disclosed |
| CN-100451045-C | Actinic ray-curable composition and use thereof | NATOCO CO LTD (JP) | 2009-01-14 | — | — | CN | disclosed |
| US-7462653-B2 | Photocurable and thermosetting composition for ink jet system and printed circuit boards made by use thereof | TAIYO INK MANUFACTURING CO., LTD. (JP) | 2008-12-09 | — | — | US | disclosed |
| EP-1624001-B1 | PHOTOCURING/THERMOSETTING INKJET COMPOSITION AND PRINTED WIRING BOARD USING SAME | TAIYO INK MFG CO LTD (JP) | 2008-04-16 | — | — | EP | disclosed |
| CN-101104704-A | Composition curable with actinic energy ray and use thereof | NATOCO CO LTD (JP) | 2008-01-16 | — | — | CN | disclosed |
| CN-101104724-A | Composition curable with actinic energy ray and use thereof | NATOCO CO LTD (JP) | 2008-01-16 | — | — | CN | disclosed |
| CN-101104670-A | Composition curable with actinic energy ray and use thereof | NATOCO CO LTD (JP) | 2008-01-16 | — | — | CN | disclosed |
| US-20060058412-A1 | Monomer having a (meth)acryloyl group and thermosetting functional group; a photoreactive diluent having a weight-average molecular weight of not more than 700; photopolymerization initiator; viscosity of not more than 150 mPa*s at 25 degrees C.; solder resist pattern directly drawn on printed circuit | TAIYO INK MFG. CO., LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| EP-1624001-A1 | PHOTOCURING/THERMOSETTING INKJET COMPOSITION AND PRINTED WIRING BOARD USING SAME | Taiyo Ink Manufacturing Co. Ltd (JP) | 2006-02-08 | — | — | EP | disclosed |
| CN-1703435-A | Actinic ray-curable composition and use thereof | NATOCO CO LTD (JP) | 2005-11-30 | — | — | CN | disclosed |