Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.31 |
| ▸ | HRH1 | P35367 | 1/20 | 0.31 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.31 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15563106 | 0.82 | KDM4E (0.40) | ALDH1A1TDP1USP2KDM4E | |
| SCHEMBL122649 | 0.80 | ALDH1A1 (0.43) | ALDH1A1TDP1USP2KDM4ELMNA | |
| SCHEMBL11959234 | 0.80 | ALDH1A1 (0.36) | ALDH1A1TDP1USP2KDM4ELMNA | |
| SCHEMBL13259999 | 0.80 | ALDH1A1 (0.36) | ALDH1A1TDP1USP2KDM4ELMNA | |
| SCHEMBL18713297 | 0.80 | ALDH1A1 (0.43) | ALDH1A1TDP1USP2KDM4ELMNA | |
| SCHEMBL16568322 | 0.77 | ALDH1A1 (0.35) | ALDH1A1TDP1USP2KDM4ELMNA | |
| SCHEMBL13532353 | 0.77 | ALDH1A1 (0.35) | ALDH1A1TDP1USP2KDM4ELMNA | |
| SCHEMBL8402115 | 0.77 | ALDH1A1 (0.35) | ALDH1A1TDP1USP2KDM4ELMNA | |
| SCHEMBL9245372 | 0.77 | ALDH1A1 (0.38) | ALDH1A1TDP1USP2KDM4ELMNA | |
| SCHEMBL11921079 | 0.77 | ALDH1A1 (0.35) | ALDH1A1TDP1USP2KDM4ELMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| CN-110709774-B | Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2023-12-08 | — | — | CN | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| US-20200264511-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-08-20 | — | — | US | disclosed |
| EP-3693793-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT | Mitsui Chemicals, Inc. (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-20200241419-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-07-30 | — | — | US | disclosed |
| CN-111183395-A | Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-05-19 | — | — | CN | disclosed |
| CN-110709774-A | Material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-01-17 | — | — | CN | disclosed |
| US-9468890-B2 | Cycloalkylnorbornene monomers, polymers derived therefrom and their use in pervaporation | PROMERUS, LLC (US) | 2016-10-18 | — | — | US | disclosed |
| US-20080199805-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS. U.S.A., INC. | 2008-08-21 | — | — | US | disclosed |
| WO-2008098189-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-14 | — | — | WO | disclosed |
| US-20080125556-A1 | Copolymerizing two norbornene monomers, one having a pendant trimethylsilyl or timethylsilylmethyl group, and the other having optional pendant halogen or alkyl groups in the presence of a palladium-based multicomponent catalyst containing palladium, phosphorus, ionic boron and ionic aluminum compounds | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| EP-1364975-B1 | PROCESSES FOR PRODUCING CYCLOOLEFIN ADDITION POLYMER | JSR CORP (JP) | 2008-04-30 | — | — | EP | disclosed |
| US-20070225461-A1 | Olefin polymers for imaging members | LEXMARK INTERNATIONAL INC. | 2007-09-27 | — | — | US | disclosed |
| US-20070112158-A1 | Novel (co)polymer, process for producing the same, and process for producing carboxylated (co)polymer | JSR CORPORATION (JP) | 2007-05-17 | — | — | US | disclosed |
| EP-1686139-A1 | NOVEL (CO)POLYMER, PROCESS FOR PRODUCING THE SAME, AND PROCESS FOR PRODUCING CARBOXYLATED (CO)POLYMER | JSR Corporation (JP) | 2006-08-02 | — | — | EP | disclosed |
| US-6911507-B2 | Processes for producing cycloolefin addition polymer | JSR CORPORATION (JP) | 2005-06-28 | — | — | US | disclosed |
| US-20040063873-A1 | Processes for producing cycloolefin addition polymer | JSR CORPORATION (JP) | 2004-04-01 | — | — | US | disclosed |
| EP-1364975-A1 | PROCESSES FOR PRODUCING CYCLOOLEFIN ADDITION POLYMER | JSR Corporation (JP) | 2003-11-26 | — | — | EP | disclosed |