Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.71 |
| ▸ | LMNA | P02545 | 2/20 | 0.64 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.42 |
| ▸ | CA2 | P00918 | 3/20 | 0.40 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.38 |
| ▸ | FDPS | P14324 | 1/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.37 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.37 |
| ▸ | GMNN | O75496 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | THPO | P40225 | 1/20 | 0.37 |
| ▸ | MTOR | P42345 | 1/20 | 0.37 |
| ▸ | BLM | P54132 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | CETP | P11597 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13286645 | 0.97 | ALDH1A1 (0.68) | ALDH1A1LMNATDP1TSHRCYP3A4 | |
| SCHEMBL7199870 | 0.97 | ALDH1A1 (0.68) | ALDH1A1LMNATDP1TSHRCYP3A4 | |
| SCHEMBL21693948 | 0.94 | ALDH1A1 (0.71) | ALDH1A1LMNATDP1TSHRCYP3A4 | |
| SCHEMBL28367269 | 0.93 | ALDH1A1 (0.77) | ALDH1A1LMNATDP1TSHRCYP3A4 | |
| SCHEMBL4609262 | 0.92 | LMNA (0.76) | ALDH1A1LMNATSHRCYP3A4FDPS | |
| SCHEMBL7201076 | 0.91 | LMNA (0.74) | ALDH1A1LMNATSHRCYP3A4CA2 | |
| SCHEMBL182760 | 0.90 | ALDH1A1 (0.81) | ALDH1A1LMNATDP1TSHRCYP3A4 | |
| SCHEMBL7209429 | 0.90 | LMNA (0.81) | ALDH1A1LMNATSHRCYP3A4FDPS | |
| SCHEMBL4609318 | 0.90 | LMNA (0.81) | ALDH1A1LMNATSHRCYP3A4FDPS | |
| SCHEMBL7204911 | 0.90 | LMNA (0.81) | ALDH1A1LMNATSHRCYP3A4FDPS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10227516-B2 | Adhesive for food packaging films | HENKEL AG & CO. KGAA (DE) | 2019-03-12 | — | — | US | claimed |
| US-20250231491-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| US-20250231492-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| CN-119816784-A | Fabrication of integrated circuits using positive photo-patternable dielectrics comprising high silicon content polysilsesquioxanes | 潍坊星泰克微电子材料有限公司 | 2025-04-11 | — | — | CN | disclosed |
| CN-119631021-A | Photolithography method using silicon photoresist | 潍坊星泰克微电子材料有限公司 | 2025-03-14 | — | — | CN | disclosed |
| EP-4508495-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | Suntific Materials (Weifang), Ltd. (CN) | 2025-02-19 | — | — | EP | disclosed |
| EP-4508493-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | Suntific Materials (Weifang), Ltd. (CN) | 2025-02-19 | — | — | EP | disclosed |
| WO-2025000535-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG), LTD. (CN) | 2025-01-02 | — | — | WO | disclosed |
| WO-2025000537-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | SUNTIFIC MATERIALS (WEIFANG), LTD. (CN) | 2025-01-02 | — | — | WO | disclosed |
| EP-3585620-B1 | 3D PRINTING DEVICES INCLUDING MIXING NOZZLES | KORNIT DIGITAL TECH LTD (IL) | 2024-05-15 | — | — | EP | disclosed |
| EP-0909752-B1 | DI(METH)ACRYLATES | KYOWA YUKA KK (JP) | 2001-09-05 | — | — | EP | disclosed |
| US-6143840-A | BLEND OF AMINO RESIN WITH A POLYESTER COMPRISING UNITS DERIVED FROM 2,4-DIALKYL-1,5-PENTANEDIOL OR 2-ALKYL-1,5-PENTANEDIOL; CURED RESIN OBTAINED BY HARDENING THE BLEND HAVING ALKALI AND HYDROLYSIS RESISTANCE; PAINT | KYOWA YUKA CO., LTD. (JP) | 2000-11-07 | — | — | US | disclosed |
| US-6087466-A | POLYESTERURETHANE COPOLYMERS | KYOWA YUKA CO., LTD. (JP) | 2000-07-11 | — | — | US | disclosed |
| EP-1000994-A1 | POLYURETHANE ADHESIVE, METHOD FOR USE IN BONDING, AND USE OF MIXTURE | Kyowa Yuka Co., Ltd. (JP) | 2000-05-17 | — | — | EP | disclosed |
| US-6048956-A | DIGLYCIDYL ETHERS OF DIOLS | KYOWA YUKA CO., LTD. (JP) | 2000-04-11 | — | — | US | disclosed |
| EP-0970995-A1 | POLYESTER RESIN COMPOSITION, CURED RESIN, AND COATING MATERIAL | Kyowa Yuka Co., Ltd. (JP) | 2000-01-12 | — | — | EP | disclosed |
| US-5952437-A | Polyurethane | KYOWA HAKKO KOGYO CO., LTD. (JP) | 1999-09-14 | — | — | US | disclosed |
| EP-0911326-A1 | DIGLYCIDYL ETHERS | Kyowa Yuka Co., Ltd. (JP) | 1999-04-28 | — | — | EP | disclosed |
| EP-0909752-A1 | DI(METH)ACRYLATES | Kyowa Yuka Co., Ltd. (JP) | 1999-04-21 | — | — | EP | disclosed |
| EP-0908481-A1 | POLYURETHANES AND POLYESTER POLYOLS | Kyowa Yuka Co., Ltd. (JP) | 1999-04-14 | — | — | EP | disclosed |