SCHEMBL461683

SCHEMBL461683

C=CCc1ccc(Oc2ccc(CC=C)c3c2CCO3)c2c1OCC2

nearest known ligand 0.37

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 3/20 0.37
ALOX15 P16050 1/20 0.37
POLB P06746 2/20 0.34
HTR2C P28335 4/20 0.34
HTR2A P28223 3/20 0.34
HTR2B P41595 3/20 0.34
ALDH1A1 P00352 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
MAPT P10636 2/20 0.32
CYP1A2 P05177 1/20 0.32
GABRA1 P14867 1/20 0.31
GABRB2 P47870 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL9689209 0.92 POLB (0.35) CYP3A4ALOX15POLBHTR2CHTR2A
Sulfuric Acid SCHEMBL7193352 0.91 POLB (0.34) CYP3A4ALOX15POLBHTR2CHTR2A
SCHEMBL11882114 0.82 INPPL1 (0.35) CYP3A4ALOX15HTR2CHTR2AHTR2B
SCHEMBL8926874 0.82 POLB (0.34) CYP3A4ALOX15POLBHTR2CHTR2A
SCHEMBL11667886 0.79 CYP3A4 (0.33) CYP3A4ALOX15POLBMAPTCYP1A2
SCHEMBL1647548 0.79 GABRA1 (0.46) CYP3A4ALOX15POLBALDH1A1MAPT
SCHEMBL9606474 0.77 CYP3A4 (0.31) CYP3A4ALOX15MAPTCYP1A2GABRA1
SCHEMBL11665412 0.74 CYP3A4 (0.39) CYP3A4ALOX15POLBALDH1A1SMN1; SMN2
SCHEMBL9329865 0.74 SLC5A2 (0.39) HTR2CHTR2AHTR2BSMN1; SMN2
SCHEMBL11080708 0.74 CYP3A4 (0.37) CYP3A4ALOX15POLBHTR2CHTR2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 206 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10407713-B2 Reagent usable for the isolation and/or purification of nucleic acids QIAGEN GMBH (DE) 2019-09-10 US claimed
EP-2729570-B1 REAGENT USABLE FOR THE ISOLATION AND/OR PURIFICATION OF NUCLEIC ACIDS QIAGEN GMBH (DE) 2017-11-22 EP claimed
US-20140154693-A1 REAGENT USABLE FOR THE ISOLATION AND/OR PURIFICATION OF NUCLEIC ACIDS QIAGEN GMBH (DE) 2014-06-05 US claimed
EP-2729570-A2 REAGENT USABLE FOR THE ISOLATION AND/OR PURIFICATION OF NUCLEIC ACIDS Qiagen GmbH (DE) 2014-05-14 EP claimed
WO-2013004710-A2 REAGENT USABLE FOR THE ISOLATION AND/OR PURIFICATION OF NUCLEIC ACIDS QIAGEN GMBH (DE) 2013-01-10 WO claimed
EP-0838344-B1 Stamp device BROTHER IND LTD (JP) 2001-08-01 EP claimed
EP-0838344-A1 Stamp device BROTHER KOGYO KABUSHIKI KAISHA (JP) 1998-04-29 EP claimed
US-5436225-A Of a cyclohexane compound, a water soluble nitrogen compound and an etherified polyether, mineral oil or vegetable oil KUMIAI CHEMICAL INDUSTRY CO., LTD. (JP) 1995-07-25 US claimed
JP-55092307-A None JP disclosed
US-12007001-B2 Cellulose-containing gear ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-06-11 US disclosed
EP-4040018-B1 A MOLDED ARTICLE ASAHI CHEMICAL IND (JP) 2024-05-22 EP disclosed
US-20240092980-A1 METHOD FOR PRODUCING RESIN COMPOSITION, AND RESIN COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-03-21 US disclosed
EP-4289885-A1 METHOD FOR PRODUCING RESIN COMPOSITION, AND RESIN COMPOSITION Sumitomo Chemical Company, Limited (JP) 2023-12-13 EP disclosed
US-20230160457-A1 Cellulose-containing gear ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-05-25 US disclosed
US-4370160-A PHOTOPOLYMERIZATION, UNSATURATED POLYSILOXANE DOW CORNING CORPORATION (US) 1983-01-25 US disclosed
JP-S5592307-A HAIR LIQUID COMPOSITION KANEBO LTD 1980-07-12 JP disclosed
US-4169718-A 2-(Dimethylcarbamoylimino)-1,3,4-thiadiazolin-3-carboxylic acid esters and herbicides containing the same SCHERING AKTIENGESELLSCHAFT (DE) 1979-10-02 US disclosed
US-4153705-A INSECTICIDES SCHERING AKTIENGESELLSCHAFT (DE) 1979-05-08 US disclosed
US-4123279-A PHENOLIC RESINS, INK RECEPTIVITY FUJI PHOTO FILM CO., LTD. (JP) 1978-10-31 US disclosed
US-4105453-A BASIC MORDANT, ACIDIC DYE, HYDROPHILIC COLLOID CONTAINING A PHENOXY(POLY)ETHOXY SULFATE OR SULFONATE, NAPHTHALENE SULFONATE LAYER KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1978-08-08 US disclosed