SCHEMBL4617510

SCHEMBL4617510

O=C(O)C1CC=CCCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABAT P80404 1/20 0.41
SLC6A1 P30531 2/20 0.39
TSHR P16473 2/20 0.39
LMNA P02545 2/20 0.39
SLC6A11 P48066 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
SLC6A13 Q9NSD5 1/20 0.39
ALDH1A1 P00352 3/20 0.36
MEN1 O00255 1/20 0.36
MAPT P10636 1/20 0.36
ALOX15 P16050 1/20 0.36
HTT P42858 1/20 0.36
KMT2A Q03164 1/20 0.36
ESR2 Q92731 1/20 0.36
HSD17B10 Q99714 1/20 0.36
KDM4E B2RXH2 2/20 0.35
GABRP O00591 1/20 0.34
GABRD O14764 1/20 0.34
GABRA1 P14867 1/20 0.34
GABRB1 P18505 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22975387 0.93 ABAT (0.39) ABATSLC6A1TSHRLMNASLC6A11
SCHEMBL23113665 0.93 ABAT (0.39) ABATSLC6A1TSHRLMNASLC6A11
SCHEMBL3598433 0.91 CES2 (0.41) ABATSLC6A1TSHRLMNASLC6A11
SCHEMBL28247066 0.91 CES2 (0.41) ABATSLC6A1TSHRLMNASLC6A11
Benzene SCHEMBL30877908 0.90 ALDH1A1 (0.40) ABATSLC6A1TSHRLMNASLC6A11
SCHEMBL28247056 0.88 TSHR (0.44) ABATSLC6A1TSHRLMNASLC6A11
SCHEMBL91180 0.86
SCHEMBL16922155 0.86
SCHEMBL28388687 0.86 ALDH1A1 (0.46) ABATTSHRLMNAALDH1A1MEN1
SCHEMBL468428 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230341777-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINAL-BLOCKED REACTION PRODUCT NISSAN CHEMICAL CORPORATION (JP) 2023-10-26 US disclosed
US-20230296984-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230259028-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS NISSAN CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
CN-108699380-B Granulating stabilizer for multi-color pattern coating 圣诺普科有限公司 2021-09-03 CN disclosed
CN-110372708-B Synthesis method of 5H-benzo [ c ] imidazo [1,2-a ] azepin-6-carboxylic acid compound 河南师范大学 2021-07-09 CN disclosed
CN-108699380-A Multicolor pattern paint granulation stabilizer 圣诺普科有限公司 2018-10-23 CN disclosed
EP-1891031-A2 PRODUCTION PROCESS OF BIFUNCTIONAL EPOXY MONOMER BY SELECTIVE OXIDATION OF DIOLEFIN COMPOUND Showa Denko K.K. (JP) 2008-02-27 EP disclosed
WO-2006123814-A2 PRODUCTION PROCESS OF BIFUNCTIONAL EPOXY MONOMER BY SELECTIVE OXIDATION OF DIOLEFIN COMPOUND SHOWA DENKO K.K. (JP) 2006-11-23 WO disclosed