SCHEMBL4624725

SCHEMBL4624725

CCCCCCCCCC1OC1c1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CFTR P13569 1/20 0.45
GRM2 Q14416 4/20 0.40
POLB P06746 1/20 0.40
FASN P49327 1/20 0.40
CTSK P43235 1/20 0.39
PPARG P37231 3/20 0.37
TSHR P16473 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27260115 1.00 CFTR (0.45) CFTRGRM2POLBFASNCTSK
SCHEMBL379440 1.00 CFTR (0.45) CFTRGRM2POLBFASNCTSK
SCHEMBL1499434 1.00 CFTR (0.45) CFTRGRM2POLBFASNCTSK
SCHEMBL50937 0.92 TSHR (0.39) CFTRGRM2TSHR
SCHEMBL9801940 0.86 GRM2 (0.40) CFTRGRM2POLBFASN
SCHEMBL3626287 0.84 TSHR (0.41) TSHR
SCHEMBL9229494 0.80 FDFT1 (0.46)
SCHEMBL9802435 0.80 SPHK1 (0.48)
SCHEMBL8415822 0.79 PLA2G4B (0.44) CTSKTSHR
SCHEMBL11427124 0.78 TSHR (0.53) CFTRGRM2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0690772-B1 COMPOSITIONS AND METHODS FOR POLISHING AND PLANARIZING SURFACES RODEL INC (US) 1998-05-13 EP claimed
EP-0690772-A1 COMPOSITIONS AND METHODS FOR POLISHING AND PLANARIZING SURFACES RODEL, INC. (US) 1996-01-10 EP claimed
EP-0690772-A4 COMPOSITIONS AND METHODS FOR POLISHING AND PLANARIZING SURFACES RODEL INC (US) 1995-06-01 EP claimed
US-5264010-A An abrasive consists of cerium oxide, fumed and precipitated silica and surfactants; abrasion RODEL, INC. (US) 1993-11-23 US claimed
WO-1993022103-A1 COMPOSITIONS AND METHODS FOR POLISHING AND PLANARIZING SURFACES RODEL, INC. (US) 1993-11-11 WO claimed
JP-8218066-A None JP disclosed
EP-1612247-B1 Ink composition for inkjet recording and method of producing lithographic printing plate using the same FUJIFILM CORP (JP) 2008-04-02 EP disclosed
US-20060004118-A1 Ink composition for inkjet recording and method of producing lithographic printing plate using the same FUJI PHOTO FILM CO., LTD. 2006-01-05 US disclosed
EP-1612247-A2 Ink composition for inkjet recording and method of producing lithographic printing plate using the same FUJI PHOTO FILM CO., LTD. (JP) 2006-01-04 EP disclosed
EP-0785720-B1 A METHOD OF CONTROLLING MOTH AND OTHER INSECT PESTS STATE OF NEW SOUTH WALES (AU) 2004-09-22 EP disclosed
US-6548588-B1 Uralkyd resin comprising amide ester diol from reaction of triglyceride oil and N,N-dialkanolamine; polyisocyanate; carboxylic acid bearing polyol; and polyoxyethylene glycol; coatings for wood and boards AVECIA INC. 2003-04-15 US disclosed
EP-1129147-B1 AQUEOUS RESIN DISPERSIONS AVECIA INC (US) 2003-04-09 EP disclosed
US-4647598-A Process for preparing water-soluble polymers DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 1987-03-03 US disclosed
CN-85104558-A The method for preparing water-soluble polymers 1986-12-10 CN disclosed
US-4620878-A OIL IN WATER EMULSIONS; POLYSILOXANE CONTAINING POLAR GROUPS WITH A SURFACTANT DOW CORNING CORPORATION (US) 1986-11-04 US disclosed
US-4604411-A POLYMERIZATION VESSEL COVERED WITH TETRAFLUOROETHYLENE-ETHYLENE FILM; NONSTICKING, PEELING DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 1986-08-05 US disclosed
EP-0138192-A1 Method of preparing polyorganosiloxane emulsions having small particle size DOW CORNING CORPORATION (US) 1985-04-24 EP disclosed
US-4445939-A METAL AND AMMONIUM SALT OF AROMATIC SULFONIC ACID, NONIONIC SURFACTANT HODSON CHEMICAL CONSTRUCTION CORPORATION, 1984-05-01 US disclosed
US-4076768-A BUTADIENE-STYRENE COPOLYMER THE DOW CHEMICAL COMPANY (US) 1978-02-28 US disclosed
US-3936365-A Radiation crosslinked block copolymer blends with improved impact resistance THE DOW CHEMICAL COMPANY (US) 1976-02-03 US disclosed