Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Phosphoric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 1/20 | 0.46 |
| ▸ | SLC34A1 | Q06495 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | MMP2 | P08253 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | FDPS | P14324 | 1/20 | 0.39 |
| ▸ | BLM | P54132 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | TYMS | P04818 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phosphoric Acid SCHEMBL28360941 | 1.00 | CA2 (0.46) | CA2SLC34A1KDM4EMMP2THRB | |
| Phosphoric Acid SCHEMBL11551243 | 1.00 | CA2 (0.46) | CA2SLC34A1KDM4EMMP2THRB | |
| Phosphoric Acid SCHEMBL28413090 | 1.00 | — | — | |
| Phosphoric Acid SCHEMBL11194187 | 1.00 | CA2 (0.46) | CA2SLC34A1KDM4EMMP2THRB | |
| Phosphoric Acid SCHEMBL9744688 | 1.00 | — | — | |
| Phosphoric Acid SCHEMBL320818 | 1.00 | — | — | |
| Phosphoric Acid SCHEMBL1302614 | 1.00 | CA2 (0.46) | CA2SLC34A1KDM4EMMP2THRB | |
| Phosphoric Acid SCHEMBL14744358 | 1.00 | CA2 (0.46) | CA2SLC34A1KDM4EMMP2THRB | |
| Phosphoric Acid SCHEMBL5937288 | 1.00 | CA2 (0.46) | CA2SLC34A1KDM4EMMP2THRB | |
| Phosphoric Acid SCHEMBL29005649 | 1.00 | CA2 (0.46) | CA2SLC34A1KDM4EMMP2THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1275695-B1 | CURABLE COMPOSITION AND MULTILAYERED CIRCUIT SUBSTRATE | ZEON CORP (JP) | 2008-06-18 | — | — | EP | disclosed |
| US-20070218397-A1 | Production Process of Polymerized Toner | ZEON CORPORATION (JP) | 2007-09-20 | — | — | US | disclosed |
| EP-1271254-B1 | ELECTROPHOTOGRAPHIC DEVELOPER, PROCESS FOR PRODUCING THE SAME, AND METHOD OF FORMING IMAGE | ZEON CORP (JP) | 2006-08-09 | — | — | EP | disclosed |
| US-7008747-B2 | Electrophotographic developer, production process thereof and image forming process | ZEON CORPORATION (JP) | 2006-03-07 | — | — | US | disclosed |
| US-6955848-B2 | Curable composition and multilayered circuit substrate | ZEON CORPORATION (JP) | 2005-10-18 | — | — | US | disclosed |
| US-20050048394-A1 | Electrophotographic developer, production process thereof and image forming process | ZEON CORPORATION (JP) | 2005-03-03 | — | — | US | disclosed |
| US-6818371-B2 | AN ELECTROPHOTOGRAPHIC DEVELOPER CONTAINING AT LEAST ONE ELEMENT SELECTED FROM THE GROUP CONSISTING OF BORON AND PHOSPHORUS IN A CONTENT OF 0.1 TO 100 PPM, WHICH PROVIDE EXCELLENT FLOWABILITY AND SHELF-STABILITY TO THE DEVELOPER | ZEON CORPORATION (JP) | 2004-11-16 | — | — | US | disclosed |
| US-20030146421-A1 | Curable composition and multilayered circuit substrate | ZEON CORPORATION (JP) | 2003-08-07 | — | — | US | disclosed |
| US-6534233-B1 | Homogenizing the monomer compositions in an aqueous dispersion medium containing a dispersion stabilizer to generate droplets; polymerizing the droplets to obtain colored polymer particles | ZEON CORPORATION (JP) | 2003-03-18 | — | — | US | disclosed |
| US-20030022086-A1 | Electrophotographic developer, process for producing the same, and method of forming image | ZEON CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| EP-1275695-A1 | CURABLE COMPOSITION AND MULTILAYERED CIRCUIT SUBSTRATE | Zeon Corporation (JP) | 2003-01-15 | — | — | EP | disclosed |
| EP-1271254-A1 | ELECTROPHOTOGRAPHIC DEVELOPER, PROCESS FOR PRODUCING THE SAME, AND METHOD OF FORMING IMAGE | Zeon Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |