Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.61 |
| ▸ | HPGD | P15428 | 1/20 | 0.61 |
| ▸ | GAA | P10253 | 4/20 | 0.56 |
| ▸ | HTT | P42858 | 3/20 | 0.56 |
| ▸ | LMNA | P02545 | 2/20 | 0.53 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.53 |
| ▸ | PKM | P14618 | 1/20 | 0.51 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.49 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4629901 | 0.89 | ALDH1A1 (0.58) | ALDH1A1KDM4EHPGDGAAHTT | |
| SCHEMBL4629666 | 0.88 | ALDH1A1 (0.57) | ALDH1A1KDM4EHPGDGAAHTT | |
| SCHEMBL4629467 | 0.86 | GAA (0.61) | ALDH1A1KDM4EHPGDGAAHTT | |
| SCHEMBL4629544 | 0.86 | ALDH1A1 (0.56) | ALDH1A1KDM4EHPGDGAAHTT | |
| SCHEMBL8415191 | 0.81 | ALDH1A1 (0.56) | ALDH1A1KDM4EHPGDGAAHTT | |
| SCHEMBL8791000 | 0.81 | ALDH1A1 (0.56) | ALDH1A1KDM4EHPGDGAAHTT | |
| SCHEMBL383077 | 0.80 | LMNA (0.61) | ALDH1A1KDM4EHPGDGAAHTT | |
| SCHEMBL29516114 | 0.80 | LMNA (0.61) | ALDH1A1KDM4EHPGDGAAHTT | |
| SCHEMBL10335829 | 0.80 | ALDH1A1 (0.68) | ALDH1A1KDM4EHPGDGAAHTT | |
| SCHEMBL9705909 | 0.79 | LMNA (0.59) | ALDH1A1KDM4EHPGDGAAHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101034260-B | Photosensitive resin composition | DONGJIN SEMICOHEM CO LTD | 2012-07-18 | — | — | CN | claimed |
| CN-101034260-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-09-12 | — | — | CN | claimed |
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| CN-117501179-A | Method of using composition containing organic acid compound, lithographic composition containing organic acid compound, and method of manufacturing resist pattern | 默克专利有限公司 | 2024-02-02 | — | — | CN | disclosed |
| CN-107615168-B | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-12-19 | — | — | CN | disclosed |
| CN-117008420-A | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-11-07 | — | — | CN | disclosed |
| CN-109804311-B | Chemically amplified positive photoresist composition and pattern forming method using the same | 默克专利有限公司 | 2023-06-06 | — | — | CN | disclosed |
| CN-115885217-A | Negative resist film laminate and pattern forming method | 信越化学工业株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-108107676-B | Chemically amplified positive resist film laminate and pattern formation method | 信越化学工业株式会社 | 2023-02-21 | — | — | CN | disclosed |
| CN-108459469-B | Pattern forming method | 信越化学工业株式会社 | 2022-11-11 | — | — | CN | disclosed |
| CN-115113482-A | Negative photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film | 信越化学工业株式会社 | 2022-09-27 | — | — | CN | disclosed |
| CN-105404096-A | CHEMICALLY AMPLIFIED POSITIVE RESIST DRY FILM, DRY FILM LAMINATE AND METHOD OF PREPARING LAMINATE | SHINETSU CHEMICAL CO | 2016-03-16 | — | — | CN | disclosed |
| CN-103163730-B | Chemical amplification type photoetching compositions is utilized to carry out the method for minor groove patterning | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (CN) | 2016-03-09 | — | — | CN | disclosed |
| CN-105301905-A | Chemically amplified positive resist composition and patterning process | SHINETSU CHEMICAL CO | 2016-02-03 | — | — | CN | disclosed |
| CN-101034260-B | Photosensitive resin composition | DONGJIN SEMICOHEM CO LTD | 2012-07-18 | — | — | CN | disclosed |
| EP-1919907-A2 | HETEROCYCLIC COMPOUND | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2008-05-14 | — | — | EP | disclosed |
| CN-101034260-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-09-12 | — | — | CN | disclosed |
| CN-1983031-A | Photosensitive resin composition for organic light emitting diodes | DONGJIN SEMICHEM CO LTD (KR) | 2007-06-20 | — | — | CN | disclosed |
| WO-2007026959-A2 | DERIVATIVES OF 4-PIPERAZIN-1-YL-4-BENZ0 [B] THIOPHENE SUITABLE FOR THE TREATMENT OF CNS DISORDERS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2007-03-08 | — | — | WO | disclosed |
| CN-1821879-A | Positive resist composition, manufacture method and application of the same | SHINETSU CHEMICAL CO (JP) | 2006-08-23 | — | — | CN | disclosed |