SCHEMBL4635634

SCHEMBL4635634

CCCCC(C)(CCCC)C(N)=O

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
FDPS P14324 3/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
LMNA P02545 1/20 0.39
HSD17B10 Q99714 1/20 0.39
CES2 O00748 3/20 0.36
CES1 P23141 2/20 0.36
SMPD1 P17405 2/20 0.34
ALDH1A1 P00352 1/20 0.34
MEN1 O00255 1/20 0.34
FAAH O00519 1/20 0.34
TP53 P04637 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2C19 P33261 1/20 0.34
SOAT1 P35610 1/20 0.34
KMT2A Q03164 1/20 0.34
ALOX15 P16050 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19685191 0.95 LMNA (0.41) FDPSCA1CA2LMNAHSD17B10
SCHEMBL18710346 0.93 FDPS (0.44) FDPSCES2SMPD1
SCHEMBL19155398 0.93 FDPS (0.44) FDPSCES2SMPD1
SCHEMBL4635906 0.93 FDPS (0.43) FDPSCA1CA2CES2SMPD1
SCHEMBL20746506 0.91 FDPS (0.45) FDPSCES2SMPD1
SCHEMBL20746312 0.91 FDPS (0.45) FDPSCES2SMPD1
SCHEMBL20746483 0.91 FDPS (0.45) FDPSCES2SMPD1
SCHEMBL20746396 0.91 FDPS (0.45) FDPSCES2SMPD1
SCHEMBL4636202 0.91 FDPS (0.45) FDPSCES2SMPD1
SCHEMBL4658597 0.91 FDPS (0.45) FDPSCES2SMPD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3739676-A1 SLURRY FOR POSITIVE ELECTRODE OF SECONDARY LITHIUM BATTERY, PREPARATION METHOD FOR SAME, AND APPLICATION THEREOF Guangzhou Tinci Materials Technology Co., Ltd (CN) 2020-11-18 EP claimed
CN-108767235-B Lithium secondary battery anode slurry and preparation method and application thereof 广州天赐高新材料股份有限公司 2020-05-29 CN claimed
CN-108767235-A Cathode plate for lithium secondary battery slurry and its preparation method and application 广州天赐高新材料股份有限公司 2018-11-06 CN claimed
CN-105358536-B partial stream distillation 巴斯夫欧洲公司 2018-02-09 CN claimed
EP-3212627-A1 PART-STREAM DISTILLATION BASF SE (DE) 2017-09-06 EP claimed
CN-107108537-A Part stream distillation 巴斯夫欧洲公司 2017-08-29 CN claimed
WO-2016066629-A1 PART-STREAM DISTILLATION BASF SE (DE) 2016-05-06 WO claimed
EP-0277841-A2 A method of producing hydrogen peroxide BRITISH INDUSTRIAL PLASTICS (S.A.) (PROPRIETARY) LIMITED (ZA) 1988-08-10 EP claimed
US-20240423206-A1 HERBICIDE TRANSPORT SYSTEM SYNGENTA CROP PROTECTION AG (CH) 2024-12-26 US disclosed
CN-118302299-A Maintenance liquid, method for producing maintenance liquid, method for maintaining ink jet recording apparatus, and ink jet recording apparatus DNP精细化工股份有限公司 2024-07-05 CN disclosed
CN-112368859-B Ethylcellulose as a dispersant for cathode production in lithium ion batteries 陶氏环球技术有限责任公司 2024-06-07 CN disclosed
CN-117957289-A Ink composition, ink set, recording method, method for producing recorded matter, and recorded matter DNP精细化工股份有限公司 2024-04-30 CN disclosed
CN-117396567-A Pretreatment ink and ink set comprising the same DNP精细化工股份有限公司 2024-01-12 CN disclosed
CN-117396566-A Aqueous ink and ink set comprising same DNP精细化工股份有限公司 2024-01-12 CN disclosed
EP-0349786-B1 METHOD OF STABILIZING 3-ISOTHIAZOLONE SOLUTION ICHIKAWA GOSEI CHEMICAL CO., LTD. (JP) 1993-02-10 EP disclosed
EP-0349786-A1 Method of stabilizing 3-isothiazolone solution ICHIKAWA GOSEI CHEMICAL CO., LTD. (JP) 1990-01-10 EP disclosed
EP-0277841-A2 A method of producing hydrogen peroxide BRITISH INDUSTRIAL PLASTICS (S.A.) (PROPRIETARY) LIMITED (ZA) 1988-08-10 EP disclosed
EP-0012321-B1 PROCESS FOR THE OBTENTION OF WATER-FREE OR SUBSTANTIALLY WATER-FREE FORMIC ACID BASF Aktiengesellschaft (DE) 1981-08-12 EP disclosed
US-4262140-A HYDROLYSIS OF METHYL FORMATE, EXTRACTION WITH TERTIARY AMIDE, FRACTIONAL DISTILLATION BASF AKTIENGESELLSCHAFT (DE) 1981-04-14 US disclosed
EP-0012321-A1 Process for the obtention of water-free or substantially water-free formic acid BASF Aktiengesellschaft (DE) 1980-06-25 EP disclosed