SCHEMBL4635937

SCHEMBL4635937

C=CCCCC(C)c1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
RIPK1 Q13546 1/20 0.48
TAAR1 Q96RJ0 3/20 0.45
TRPA1 O75762 4/20 0.42
AOC3 Q16853 2/20 0.41
CYP2C19 P33261 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2750250 0.94 RIPK1 (0.47) RIPK1TAAR1TRPA1AOC3CYP2C19
SCHEMBL17183737 0.93 RIPK1 (0.46) RIPK1TAAR1TRPA1AOC3CYP2C19
SCHEMBL17183771 0.93 RIPK1 (0.46) RIPK1TAAR1TRPA1AOC3CYP2C19
SCHEMBL17183799 0.93 RIPK1 (0.46) RIPK1TAAR1TRPA1AOC3CYP2C19
SCHEMBL17183735 0.93 RIPK1 (0.46) RIPK1TAAR1TRPA1AOC3CYP2C19
SCHEMBL17183640 0.93 RIPK1 (0.46) RIPK1TAAR1TRPA1AOC3CYP2C19
SCHEMBL17183818 0.93 RIPK1 (0.46) RIPK1TAAR1TRPA1AOC3CYP2C19
SCHEMBL4636038 0.88 RIPK1 (0.52) RIPK1TAAR1TRPA1AOC3CYP2C19
SCHEMBL5040191 0.84 RIPK1 (0.36) RIPK1TAAR1TRPA1AOC3
SCHEMBL9074491 0.82 HRH1 (0.54) TAAR1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11492432-B2 Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2022-11-08 US disclosed
US-11015010-B2 Block copolymer comprising catechol segment and inorganic nanoparticles coated by said block copolymer, as well as method for producing block copolymer comprising catechol segment and method for producing inorganic nanoparticles coated by said block copolymer JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2021-05-25 US disclosed
US-10851237-B2 Block copolymer, multilayered structure, solid polymer membrane, fuel cell, method for producing multilayered structure, and method for producing multilayered structure including inorganic nanoparticles JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2020-12-01 US disclosed
US-20200223125-A1 RESIN FOR NANOIMPRINTING, LAMINATE CONTAINING RESIN FOR NANOIMPRINTING, PRINTED BOARD CONTAINING RESIN FOR NANOIMPRINTING, AND METHOD FOR PRODUCING NANOIMPRINT SUBSTRATE JAPAN SCIENCE & TECH AGENCY (JP) 2020-07-16 US disclosed
US-20190169420-A1 BLOCK COPOLYMER, MULTILAYER STRUCTURE, SOLID POLYMER FILM, FUEL CELL, PRODUCTION METHOD FOR MULTILAYER STRUCTURE, AND PRODUCTION METHOD FOR MULTILAYER STRUCTURE CONTAINING INORGANIC NANOPARTICLES JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2019-06-06 US disclosed
EP-3112387-B1 BLOCK COPOLYMER CONTAINING CATECHOL SEGMENT, INORGANIC NANOPARTICLES COATED BY SAID BLOCK COPOLYMER, METHOD FOR PRODUCING BLOCK COPOLYMER CONTAINING CATECHOL SEGMENT, AND METHOD FOR PRODUCING INORGANIC NANOPARTICLES COATED BY SAID BLOCK COPOLYMER JAPAN SCIENCE & TECH AGENCY (JP) 2018-04-04 EP disclosed
US-20170008993-A1 BLOCK COPOLYMER COMPRISING CATECHOL ,SEGMENT AND INORGANIC NANOPARTICLES COATED BY SAID BLOCK COPOLYMER, AS WELL AS METHOD FOR PRODUCING BLOCK COPOLYMER COMPRISING CATECHOL, SEGMENT AND METHOD FOR PRODUCING INORGANIC NANOPARTICLES COATED BY SAID BLOCK COPOLYMER JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2017-01-12 US disclosed
EP-3112387-A1 BLOCK COPOLYMER CONTAINING CATECHOL SEGMENT, INORGANIC NANOPARTICLES COATED BY SAID BLOCK COPOLYMER, METHOD FOR PRODUCING BLOCK COPOLYMER CONTAINING CATECHOL SEGMENT, AND METHOD FOR PRODUCING INORGANIC NANOPARTICLES COATED BY SAID BLOCK COPOLYMER Japan Science and Technology Agency (JP) 2017-01-04 EP disclosed
US-20150298387-A1 RESIN FOR NANOIMPRINTING, LAMINATE CONTAINING RESIN FOR NANOIMPRINTING, PRINTED BOARD CONTAINING RESIN FOR NANOIMPRINTING, AND METHOD FOR PRODUCING NANOIMPRINT SUBSTRATE JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2015-10-22 US disclosed
EP-1934418-A1 UTILITY POLE OF THERMOPLASTIC COMPOSITE MATERIAL Pirelli & C. S.p.A. (IT) 2008-06-25 EP disclosed
US-6218469-B1 Unsaturated elastomer compositions and their vulcanized rubbers MITSUI CHEMICALS INC (JP) 2001-04-17 US disclosed
US-6143827-A CONJUGATED DIENE COPOLYMER; MOLDABILITY, TENSILE STRENGTH MITSUI CHEMICALS INC (JP) 2000-11-07 US disclosed
CN-1208050-A Olefin thermoplastic elastomer composition MITSUI CHEMICALS INC (JP) 1999-02-17 CN disclosed
EP-0893245-A1 VULCANIZED MOLDING HAVING SURFACE DECORATIVE LAYER, PAINTED THERMOPLASTIC RESIN COMPOSITION, AND PAINTED ELASTOMER COMPOSITION Mitsui Chemicals, Inc. (JP) 1999-01-27 EP disclosed
CN-1206026-A Unsaturated elastomer compositions and their vulcanized MITSUI CHEMICALS INC (JP) 1999-01-27 CN disclosed
EP-0892014-A1 Olefin thermoplastic elastomer composition Mitsui Chemicals, Inc. (JP) 1999-01-20 EP disclosed
EP-0892013-A1 Unsaturated elastomer compositions and their vulcanized rubbers Mitsui Chemicals, Inc. (JP) 1999-01-20 EP disclosed
EP-0634427-B1 Higher alpha-olefin copolymer, process for the preparation of the same, rubber composition comprising the same, and rubber molded product comprising the same MITSUI CHEMICALS INC (JP) 1998-05-20 EP disclosed
US-5430117-A Nonconjugated diene-vinyl aromatic-α-olefin interpolymers MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1995-07-04 US disclosed
EP-0634427-A1 Higher alpha-olefin copolymer, process for the preparation of the same, rubber composition comprising the same, and rubber molded product comprising the same MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1995-01-18 EP disclosed