SCHEMBL463763

SCHEMBL463763

C=C(C)C(=O)OC1C(OC)C2OC3(CCCC3)OC2C2OC3(CCCC3)OC12

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL328625 0.96 — —
SCHEMBL463762 0.85 ALDH1A1 (0.35) ALDH1A1
SCHEMBL416363 0.82 ALDH1A1 (0.31) ALDH1A1
SCHEMBL416278 0.79 — —
SCHEMBL328616 0.78 ALDH1A1 (0.32) ALDH1A1
SCHEMBL19600987 0.78 POLB (0.31) ALDH1A1
SCHEMBL19479801 0.73 POLB (0.33) ALDH1A1
SCHEMBL19479799 0.73 POLB (0.33) ALDH1A1
SCHEMBL988652 0.73 POLB (0.33) ALDH1A1
SCHEMBL328671 0.72 CA2 (0.37) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120064456-A1 PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS DOW GLOBAL TECHNOLOGIES LLC (US) 2012-03-15 — — US disclosed
EP-2428843-A1 Photoresist compositions and methods of forming photolithographic patterns Rohm and Haas Electronic Materials LLC (US) 2012-03-14 — — EP disclosed
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