SCHEMBL4642553

SCHEMBL4642553

CC=C(C)C(=O)OC(CO)(CO)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7077697 0.90
SCHEMBL3804683 0.80 GAA (0.31)
SCHEMBL28331703 0.78
SCHEMBL963351 0.75 GAA (0.32)
SCHEMBL65971 0.74 KDM4E (0.31)
SCHEMBL10477043 0.74 ALDH1A1 (0.44)
SCHEMBL3666663 0.74 CYP4F2 (0.40)
SCHEMBL1773225 0.74
SCHEMBL7692060 0.73 DGAT1 (0.36)
SCHEMBL28557899 0.73 DGAT1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9771400-B2 Photoactive silk protein and fabrication of silk protein structures using photolithography VIRGINIA COMMONWEALTH UNIVERSITY (US) 2017-09-26 US disclosed
US-9753188-B2 Inorganic-organic hybrid material, optical material using the same, and inorganic-organic composite composition NIPPON KASEI CHEMICAL COMPANY LIMITED (JP) 2017-09-05 US disclosed
US-20150376248-A1 PHOTOACTIVE SILK PROTEIN AND FABRICATION OF SILK PROTEIN STRUCTURES USING PHOTOLITHOGRAPHY VIRGINIA COMMONWEALTH UNIVERSITY 2015-12-31 US disclosed
EP-2586826-B1 INORGANIC-ORGANIC HYBRID MATERIAL, OPTICAL MATERIAL USING SAME, AND INORGANIC-ORGANIC COMPOSITE COMPOSITION NIPPON KASEI CHEM (JP) 2015-11-25 EP disclosed
US-20140316033-A1 INORGANIC-ORGANIC HYBRID MATERIAL, OPTICAL MATERIAL USING THE SAME, AND INORGANIC-ORGANIC COMPOSITE COMPOSITION NIPPON KASEI CHEMICAL COMPANY LIMITED (JP) 2014-10-23 US disclosed
US-8815388-B2 Inorganic-organic hybrid material, optical material using the same, and inorganic-organic composite composition NIPPON KASEI CHEMICAL COMPANY LIMITED (JP) 2014-08-26 US disclosed
WO-2014123761-A1 PHOTOACTIVE SILK PROTEIN AND FABRICATION OF SILK PROTEIN STRUCTURES USING PHOTOLITHOGRAPHY VIRGINIA COMMONWEALTH UNIVERSITY (US) 2014-08-14 WO disclosed
US-20130116362-A1 INORGANIC-ORGANIC HYBRID MATERIAL, OPTICAL MATERIAL USING THE SAME, AND INORGANIC-ORGANIC COMPOSITE COMPOSITION MITSUBISHI CHEMICAL CORPORATION (JP) 2013-05-09 US disclosed
EP-2586826-A1 INORGANIC-ORGANIC HYBRID MATERIAL, OPTICAL MATERIAL USING SAME, AND INORGANIC-ORGANIC COMPOSITE COMPOSITION Nippon Kasei Chemical Company Limited (JP) 2013-05-01 EP disclosed
EP-1591098-B1 Cationically curable composition for dental use TOKUYAMA CORP (JP) 2008-08-13 EP disclosed
US-7365106-B2 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2008-04-29 US disclosed
US-20050250868-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-10 US disclosed
EP-1591098-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-02 EP disclosed
US-6432612-B1 ADDITION-CONDENSATION COPOLYMER GOO CHEMICAL CO., LTD. (JP) 2002-08-13 US disclosed
EP-0106351-B2 PHOTOPOLYMERIZABLE PHOTOSENSITIVE COMPOSITION MITSUBISHI KASEI CORPORATION (JP) 1991-10-09 EP disclosed
EP-0106351-B1 PHOTOPOLYMERIZABLE PHOTOSENSITIVE COMPOSITION MITSUBISHI KASEI CORPORATION (JP) 1987-08-26 EP disclosed
US-4537855-A PHOTOPOLYMERIZABLE HIGH MOLECULAR WEIGHT COMPOUND HAVING POLYFUCTIONAL ETHYLENICALLY UNSATURATED SIDE CHAIN OR END GROUPS MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1985-08-27 US disclosed
EP-0106351-A2 Photopolymerizable photosensitive composition MITSUBISHI KASEI CORPORATION (JP) 1984-04-25 EP disclosed