⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1403160 | 0.84 | — | — | |
| SCHEMBL4644339 | 0.79 | — | — | |
| SCHEMBL3684979 | 0.74 | — | — | |
| SCHEMBL4646433 | 0.72 | — | — | |
| SCHEMBL19637952 | 0.71 | — | — | |
| SCHEMBL3689820 | 0.69 | HTT (0.31) | — | |
| SCHEMBL4645960 | 0.68 | — | — | |
| SCHEMBL19638398 | 0.68 | — | — | |
| SCHEMBL2411179 | 0.68 | — | — | |
| SCHEMBL1402580 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |