SCHEMBL4646032

SCHEMBL4646032

c1ccc2c(C3CCCCC3)c3ccccc3c(C3CCCCC3)c2c1

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
PDE5A O76074 2/20 0.40
ATM Q13315 1/20 0.40
KDM4E B2RXH2 1/20 0.39
HSD17B10 Q99714 1/20 0.39
CYP11B2 P19099 1/20 0.39
PTPRC P08575 1/20 0.38
PTPRF P10586 1/20 0.38
PTPN1 P18031 1/20 0.38
CDC25B P30305 1/20 0.38
CYP1B1 Q16678 1/20 0.38
IDO1 P14902 1/20 0.37
CXCR4 P61073 1/20 0.37
SLC18A3 Q16572 1/20 0.36
ABCB1 P08183 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29853814 1.00 TDP1 (0.43) TDP1L3MBTL1PDE5AATMKDM4E
SCHEMBL24576766 0.89 TDP1 (0.38) TDP1L3MBTL1PDE5AATMKDM4E
SCHEMBL4645332 0.84 CYP1B1 (0.43) TDP1L3MBTL1PDE5AATMKDM4E
SCHEMBL2959582 0.83 TDP1 (0.37) TDP1L3MBTL1PDE5AATMKDM4E
SCHEMBL11120941 0.82 HDAC1 (0.35) TDP1L3MBTL1PDE5AATMKDM4E
SCHEMBL24557335 0.82 TDP1 (0.34) TDP1L3MBTL1PDE5AATMKDM4E
SCHEMBL1102615 0.82 CYP11B2 (0.49) TDP1L3MBTL1KDM4ECYP11B2IDO1
SCHEMBL1102996 0.81 L3MBTL1 (0.40) TDP1L3MBTL1KDM4ECYP11B2
SCHEMBL1103256 0.77 TLR7 (0.46) TDP1L3MBTL1PDE5AATMKDM4E
SCHEMBL24611460 0.76 TDP1 (0.36) TDP1L3MBTL1PDE5AATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4091578-B1 METHOD FOR PRODUCING PLATE DENTURE TOKUYAMA DENTAL CORP (JP) 2024-10-09 EP disclosed
US-11857385-B2 Method of producing plate denture, curable composition for stereolithography, and plate denture production kit TOKUYAMA DENTAL CORPORATION (JP) 2024-01-02 US disclosed
CN-114929158-B Method for producing denture, curable composition for photoforming, and kit for producing denture 株式会社德山齿科 2023-10-20 CN disclosed
US-20230137898-A1 METHOD OF PRODUCING PLATE DENTURE, CURABLE COMPOSITION FOR STEREOLITHOGRAPHY, AND PLATE DENTURE PRODUCTION KIT TOKUYAMA DENTAL CORPORATION (JP) 2023-05-04 US disclosed
EP-4091578-A1 METHOD FOR PRODUCING PLATE DENTURE, CURABLE STEREOLITHOGRAPHIC COMPOSITION, AND PLATE DENTURE PRODUCTION KIT Tokuyama Dental Corporation (JP) 2022-11-23 EP disclosed
CN-114929158-A Method for producing a denture, curable composition for photo-molding, and kit for producing a denture 株式会社德山齿科 2022-08-19 CN disclosed
CN-103988313-A Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPROATION 2014-08-13 CN disclosed
EP-1591098-B1 Cationically curable composition for dental use TOKUYAMA CORP (JP) 2008-08-13 EP disclosed
US-7365106-B2 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2008-04-29 US disclosed
EP-1431315-B1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORP (JP) 2007-10-17 EP disclosed
CN-1732883-A Cationically curable composition for dental use TOKUYAMA CORP (JP) 2006-02-15 CN disclosed
US-20050250868-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-10 US disclosed
EP-1591098-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-02 EP disclosed
US-20040186195-A1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORPORATION (JP) 2004-09-23 US disclosed
CN-1513884-A Photopolymerization initiator and composition capable of photopolymerization 株式会社德山 2004-07-21 CN disclosed
EP-1431315-A2 Photopolymerization initiator and photopolymerizable composition Tokuyama Corporation (JP) 2004-06-23 EP disclosed