⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4741396 | 0.84 | — | — | |
| SCHEMBL4646034 | 0.82 | — | — | |
| SCHEMBL4646828 | 0.76 | — | — | |
| SCHEMBL4647767 | 0.76 | — | — | |
| SCHEMBL4644519 | 0.74 | — | — | |
| SCHEMBL4645642 | 0.74 | — | — | |
| SCHEMBL4646674 | 0.73 | — | — | |
| SCHEMBL4647097 | 0.71 | — | — | |
| SCHEMBL4648962 | 0.70 | — | — | |
| SCHEMBL4647291 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105754099-B | Composition and polymer | 旭化成株式会社 | 2018-09-18 | — | — | CN | disclosed |
| CN-103502315-B | Composition and polymer | 旭化成株式会社 | 2016-08-17 | — | — | CN | disclosed |
| CN-105754099-A | Composition and polymer | 旭化成株式会社 | 2016-07-13 | — | — | CN | disclosed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |