SCHEMBL4648094

SCHEMBL4648094

Cc1c2ccccc2c(C)c2cc3c(ccc4cc5ccccc5cc43)cc12

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.57
HSD17B10 Q99714 5/20 0.57
CYP1A2 P05177 5/20 0.57
HPGD P15428 3/20 0.57
HIF1A Q16665 2/20 0.56
CYP1B1 Q16678 1/20 0.56
TSHR P16473 3/20 0.50
L3MBTL1 Q9Y468 2/20 0.50
CYP3A4 P08684 1/20 0.50
MAPK1 P28482 1/20 0.50
CASP1 P29466 1/20 0.50
RAB9A P51151 1/20 0.50
CASP7 P55210 1/20 0.50
ATM Q13315 1/20 0.50
CYP2A6 P11509 5/20 0.45
TDP1 Q9NUW8 2/20 0.43
MAOA P21397 2/20 0.41
ERBB2 P04626 1/20 0.41
FYN P06241 1/20 0.41
ACHE P22303 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27947383 0.91 CYP1A2 (0.55) ALDH1A1HSD17B10CYP1A2HPGDHIF1A
SCHEMBL4646013 0.89 HSD17B10 (0.50) ALDH1A1HSD17B10CYP1A2HPGDHIF1A
SCHEMBL29853851 0.89 HSD17B10 (0.54) ALDH1A1HSD17B10CYP1A2HPGDHIF1A
SCHEMBL4644690 0.89 HSD17B10 (0.54) ALDH1A1HSD17B10CYP1A2HPGDHIF1A
SCHEMBL29853846 0.83 CYP2A6 (0.50) ALDH1A1HSD17B10CYP1A2HPGDHIF1A
SCHEMBL4642683 0.83 CYP2A6 (0.50) ALDH1A1HSD17B10CYP1A2HPGDHIF1A
SCHEMBL4853466 0.83 ALDH1A1 (0.68) ALDH1A1HSD17B10CYP1A2HPGDHIF1A
SCHEMBL6891640 0.82 CYP1A2 (0.48) ALDH1A1HSD17B10CYP1A2HPGDHIF1A
SCHEMBL4642324 0.82 HSD17B10 (0.71) ALDH1A1HSD17B10CYP1A2HPGDHIF1A
SCHEMBL4848625 0.81 ALDH1A1 (0.67) ALDH1A1HSD17B10CYP1A2HPGDHIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9177819-B2 Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPORATION (JP) 2015-11-03 US disclosed
US-20140349485-A1 METHOD FOR MANUFACTURING SILICON SUBSTRATE HAVING TEXTURED STRUCTURE TOKUYAMA CORPORATION a corporation 2014-11-27 US disclosed
CN-103988313-A Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPROATION 2014-08-13 CN disclosed
EP-1591098-B1 Cationically curable composition for dental use TOKUYAMA CORP (JP) 2008-08-13 EP disclosed
US-7365106-B2 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2008-04-29 US disclosed
EP-1431315-B1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORP (JP) 2007-10-17 EP disclosed
US-20050250868-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-10 US disclosed
EP-1591098-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-02 EP disclosed
US-20040186195-A1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORPORATION (JP) 2004-09-23 US disclosed
CN-1513884-A Photopolymerization initiator and composition capable of photopolymerization 株式会社德山 2004-07-21 CN disclosed
EP-1431315-A2 Photopolymerization initiator and photopolymerizable composition Tokuyama Corporation (JP) 2004-06-23 EP disclosed