Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.40 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 1/20 | 0.39 |
| ▸ | CETP | P11597 | 3/20 | 0.39 |
| ▸ | MMP2 | P08253 | 1/20 | 0.39 |
| ▸ | MMP3 | P08254 | 1/20 | 0.39 |
| ▸ | MMP9 | P14780 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL160393 | 1.00 | MEN1 (0.42) | MEN1KMT2ADNM1EPHX2TP53 | |
| SCHEMBL4386268 | 1.00 | MEN1 (0.42) | MEN1KMT2ADNM1EPHX2TP53 | |
| SCHEMBL5301933 | 1.00 | MEN1 (0.42) | MEN1KMT2ADNM1EPHX2TP53 | |
| SCHEMBL9165455 | 1.00 | MEN1 (0.42) | MEN1KMT2ADNM1EPHX2TP53 | |
| SCHEMBL837479 | 1.00 | MEN1 (0.42) | MEN1KMT2ADNM1EPHX2TP53 | |
| SCHEMBL427955 | 1.00 | MEN1 (0.42) | MEN1KMT2ADNM1EPHX2TP53 | |
| SCHEMBL868174 | 1.00 | MEN1 (0.42) | MEN1KMT2ADNM1EPHX2TP53 | |
| SCHEMBL3149218 | 1.00 | MEN1 (0.42) | MEN1KMT2ADNM1EPHX2TP53 | |
| SCHEMBL1703685 | 1.00 | MEN1 (0.42) | MEN1KMT2ADNM1EPHX2TP53 | |
| SCHEMBL5302396 | 1.00 | MEN1 (0.42) | MEN1KMT2ADNM1EPHX2TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12269969-B2 | Polishing composition and method with high selectivity for silicon nitride and polysilicon over silicon oxide | CMC MATERIALS LLC (US) | 2025-04-08 | — | — | US | claimed |
| EP-4048751-B1 | POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE | CMC MAT LLC (US) | 2025-03-19 | — | — | EP | claimed |
| EP-4048751-A1 | POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE | CMC Materials, Inc. (US) | 2022-08-31 | — | — | EP | claimed |
| WO-2021081145-A1 | POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE | CMC MATERIALS, INC. (US) | 2021-04-29 | — | — | WO | claimed |
| US-20210115297-A1 | POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE | CMC MATERIALS LLC | 2021-04-22 | — | — | US | claimed |
| EP-1973974-B1 | A PROCESS FOR PREPARING 'ONIUM SALTS | SUN CHEMICAL CORP (US) | 2014-04-30 | — | — | EP | claimed |
| US-7863459-B2 | Process for preparing onium salts | SUN CHEMICAL CORPORATION (US) | 2011-01-04 | — | — | US | claimed |
| US-20080287686-A1 | Process for Preparing Onium Salts | SUN CHEMICAL CORP (US) | 2008-11-20 | — | — | US | claimed |
| EP-1973974-A2 | A PROCESS FOR PREPARING 'ONIUM SALTS | Sun Chemical Corporation (US) | 2008-10-01 | — | — | EP | claimed |
| WO-2007075498-A2 | A PROCESS FOR PREPARING 'ONIUM SALTS | SUN CHEMICAL CORPORATION (US) | 2007-07-05 | — | — | WO | claimed |
| US-20250235805-A1 | LUBRICANT FOR FILTRATION CONTAINING ONIUM IONS | TOKUYAMA CORPORATION (JP) | 2025-07-24 | — | — | US | disclosed |
| US-12269969-B2 | Polishing composition and method with high selectivity for silicon nitride and polysilicon over silicon oxide | CMC MATERIALS LLC (US) | 2025-04-08 | — | — | US | disclosed |
| EP-4048751-B1 | POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE | CMC MAT LLC (US) | 2025-03-19 | — | — | EP | disclosed |
| US-20250084309-A1 | SEMICONDUCTOR PROCESSING SOLUTION | TOKUYAMA CORPORATION (JP) | 2025-03-13 | — | — | US | disclosed |
| EP-4506982-A1 | LUBRICANT FOR FILTRATION CONTAINING ONIUM IONS | TOKUYAMA CORPORATION (JP) | 2025-02-12 | — | — | EP | disclosed |
| EP-0064293-B1 | PROCESS FOR THE PRODUCTION OF HEXAFLUOROPROPYLENE OXIDE | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1986-12-10 | — | — | EP | disclosed |
| CN-85109209-A | The preparation method of oxa-ring fourth-2-ketone compounds | — | 1986-09-17 | — | — | CN | disclosed |
| EP-0143655-A1 | Process for the preparation of perfluoroalkene oxides | Montedison S.p.A. (IT) | 1985-06-05 | — | — | EP | disclosed |
| EP-0100488-A1 | Fluoroepoxides and a process for production thereof | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1984-02-15 | — | — | EP | disclosed |
| EP-0064293-A1 | Process for the production of hexafluoropropylene oxide | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1982-11-10 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080287686-A1 | Process for Preparing Onium Salts | IK, NOTUM, NOS2 | MEN1 3526/4885KMT2A 2078/4885DNM1 1560/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.