⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24058 | 0.61 | — | — | |
| SCHEMBL372757 | 0.61 | — | — | |
| SCHEMBL345482 | 0.58 | — | — | |
| SCHEMBL15547095 | 0.58 | — | — | |
| SCHEMBL1359200 | 0.55 | — | — | |
| SCHEMBL9562195 | 0.55 | — | — | |
| SCHEMBL6821294 | 0.55 | — | — | |
| SCHEMBL6821289 | 0.55 | — | — | |
| SCHEMBL18489985 | 0.55 | — | — | |
| SCHEMBL9015942 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024258914-A1 | PRECURSORS FOR LOW DIELECTRIC FILM DEPOSITION | LAM RESEARCH CORPORATION (US) | 2024-12-19 | — | — | WO | claimed |
| CN-119081113-A | Membrane material for heat exchange core and preparation method and application thereof | 中山市福维环境科技有限公司 | 2024-12-06 | — | — | CN | claimed |
| WO-2024225879-A1 | COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM AND SILICON-CONTAINING THIN FILM MANUFACTURED USING SAME | (주)디엔에프 | 2024-10-31 | — | — | WO | claimed |
| CN-103985904-A | Non-aqueous electrolyte capable of improving high-temperature performance for lithium ion battery | ZHUHAI SMOOTHWAY ELECTRONIC MATERIALS CO LTD | 2014-08-13 | — | — | CN | claimed |
| JP-8201746-A | — | — | None | — | — | JP | disclosed |
| JP-58167597-A | — | — | None | — | — | JP | disclosed |
| CN-121311621-A | Precursor for low dielectric film deposition | 朗姆研究公司 | 2026-01-09 | — | — | CN | disclosed |
| CN-121002221-A | Composition for silicon-containing film deposition and silicon-containing film produced using same | DNF有限公司 | 2025-11-21 | — | — | CN | disclosed |
| WO-2024258914-A1 | PRECURSORS FOR LOW DIELECTRIC FILM DEPOSITION | LAM RESEARCH CORPORATION (US) | 2024-12-19 | — | — | WO | disclosed |
| CN-119081113-A | Membrane material for heat exchange core and preparation method and application thereof | 中山市福维环境科技有限公司 | 2024-12-06 | — | — | CN | disclosed |
| WO-2024225879-A1 | COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM AND SILICON-CONTAINING THIN FILM MANUFACTURED USING SAME | (주)디엔에프 | 2024-10-31 | — | — | WO | disclosed |
| WO-2024225879-A1 | COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM AND SILICON-CONTAINING THIN FILM MANUFACTURED USING SAME | (주)디엔에프 | 2024-10-31 | — | — | WO | disclosed |
| EP-1300433-A2 | Perfluoropolyether-modified silane, surface treating agent, and antireflection filter | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-04-09 | — | — | EP | disclosed |
| US-6528672-B2 | Perfluoropolyether-modified aminosilane formed by hydrosilation reaction of diallylamide derivatives of a corresponding hexafluoropropylene oxide oligomer with a corrosponding hydroxysilane | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-03-04 | — | — | US | disclosed |
| US-20020071959-A1 | Perfluoropolyether-modified aminosilane, surface treating agent and coated article | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-13 | — | — | US | disclosed |
| US-6200684-B1 | RAPID CURING TO A FILM HAVING IMPROVED WATER AND OIL REPELLENCY AND GOOD BONDING STRENGTH TO SUBSTRATE; RELEASE AGENTS; ANTISOILANTS; LUBRICANTS; PROTECTIVE COATINGS; PAPER, CERAMICS; GLASS, METALS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-03-13 | — | — | US | disclosed |
| EP-1059320-A2 | Perfluoropolyether-modified amonisilane, surface treating agent, and aminosilane-coated article | Shin-Etsu Chemical Co., Ltd. (JP) | 2000-12-13 | — | — | EP | disclosed |
| JP-H08201746-A | TREATMENT FOR PREVENTION OF CONTAMINATION OF LIQUID CRYSTAL DISPLAY SCREEN | NEOS CO LTD | 1996-08-09 | — | — | JP | disclosed |
| EP-0361733-A2 | Low compression set fluorosilicone rubber | DOW CORNING CORPORATION (US) | 1990-04-04 | — | — | EP | disclosed |
| JP-S58167597-A | FLUOROAMINOSILANE | CHISSO CORP | 1983-10-03 | — | — | JP | disclosed |