SCHEMBL4656363

SCHEMBL4656363

C1CCCCCCCCC1.C1CCCCCCCCC1.CC(C(=O)O)=C(C)C1CCCCCCCCC1

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.46
CES1 P23141 1/20 0.46
HDAC8 Q9BY41 1/20 0.39
HDAC6 Q9UBN7 1/20 0.39
TSHR P16473 2/20 0.38
ALDH1A1 P00352 1/20 0.38
RECQL P46063 1/20 0.38
LMNA P02545 2/20 0.35
KMT2A Q03164 2/20 0.35
MEN1 O00255 1/20 0.35
HSD11B1 P28845 3/20 0.34
GAA P10253 2/20 0.34
HPGD P15428 1/20 0.34
EPHX1 P07099 1/20 0.33
HSD11B2 P80365 1/20 0.33
SRD5A2 P31213 1/20 0.33
KDM4E B2RXH2 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL464870 1.00 CES2 (0.46) CES2CES1HDAC8HDAC6TSHR
SCHEMBL3267641 1.00 CES2 (0.46) CES2CES1HDAC8HDAC6TSHR
SCHEMBL27492024 1.00 CES2 (0.46) CES2CES1HDAC8HDAC6TSHR
SCHEMBL479710 1.00 CES2 (0.46) CES2CES1HDAC8HDAC6TSHR
SCHEMBL2000689 1.00 CES2 (0.46) CES2CES1HDAC8HDAC6TSHR
SCHEMBL157327 1.00 CES2 (0.46) CES2CES1HDAC8HDAC6TSHR
SCHEMBL479450 1.00 CES2 (0.46) CES2CES1HDAC8HDAC6TSHR
SCHEMBL479553 0.98 CES2 (0.42) CES2CES1HDAC8HDAC6TSHR
SCHEMBL3788611 0.98 CES2 (0.42) CES2CES1HDAC8HDAC6TSHR
SCHEMBL27902117 0.93 CES2 (0.36) CES2CES1HDAC8HDAC6TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103646623-A Method for manufacturing image display device, and image display device DEXERIALS CORPERATION 2014-03-19 CN disclosed
EP-1591806-B1 Diffractive optical element CANON KK (JP) 2008-12-03 EP disclosed
US-7236302-B2 Diffraction optical element CANON KABUSHIKI KAISHA (JP) 2007-06-26 US disclosed
US-20050243423-A1 Diffraction optical element CANON KABUSHIKI KAISHA (JP) 2005-11-03 US disclosed
EP-1591806-A1 Diffractive optical element CANON KABUSHIKI KAISHA (JP) 2005-11-02 EP disclosed
US-6437052-B1 Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same NEC CORPORATION (JP) 2002-08-20 US disclosed
US-20020016431-A1 Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same background of the invention NEC CORPORATION 2002-02-07 US disclosed
US-6287746-B1 PHOTOACID GENERATOR NEC CORPORATION (JP) 2001-09-11 US disclosed
US-6030747-A CHEMICALLY AMPLIFIED RESIST CONSISTS OF A PHOTOACID GENERATOR, A CROSSLINKING AGENT ACTIVATED IN PRESENCE OF ACID AND A COPOLYMER OF ACRYLIC OR METHACRYLIC ESTER CONTAINING AN ACID, HYDROXY OR ESTER POLAR GROUP AND A COMPOUND NEC CORPORATION (JP) 2000-02-29 US disclosed
US-5621019-A PHOTORESIST CONTAINING PHOTO ACID GENERATOR AND ULTRAVIOLET RADIATION TRANSPARENT ACRYLIC POLYMER HAVING BRIDGED CYCLOHYDROCARBON GROUP RESIDUE; RESOLUTION, DRY ETCH RESISTANCE NEC CORPORATION (JP) 1997-04-15 US disclosed