SCHEMBL465707

SCHEMBL465707

CCCC[Te]Cc1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 2/20 0.46
SIGMAR1 Q99720 2/20 0.46
OPRM1 P35372 3/20 0.44
DRD3 P35462 3/20 0.44
CHRM2 P08172 1/20 0.44
HTR1A P08908 1/20 0.44
ADRA2A P08913 1/20 0.44
CHRM1 P11229 1/20 0.44
DRD1 P21728 1/20 0.44
SLC6A2 P23975 1/20 0.44
SLC6A4 P31645 1/20 0.44
ADRA1A P35348 1/20 0.44
SLC6A3 Q01959 1/20 0.44
TP53 P04637 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.41
DRD2 P14416 2/20 0.40
OPRD1 P41143 2/20 0.40
OPRK1 P41145 2/20 0.40
DNM1 Q05193 1/20 0.40
CETP P11597 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL465666 0.85 KCNH2 (0.49) KCNH2SIGMAR1OPRM1DRD3CHRM2
SCHEMBL465636 0.77 TP53 (0.50) KCNH2OPRM1DRD3CHRM2HTR1A
SCHEMBL9400817 0.75 ALDH1A1 (0.50) TP53SMN1; SMN2HTR2A
Butylbenzyl SCHEMBL22716183 0.74 SIGMAR1 (0.59) KCNH2SIGMAR1OPRM1DRD3CHRM2
Butylbenzyl SCHEMBL3229215 0.74 SIGMAR1 (0.59) KCNH2SIGMAR1OPRM1DRD3CHRM2
Butylbenzyl SCHEMBL16051 0.74 SIGMAR1 (0.59) KCNH2SIGMAR1OPRM1DRD3CHRM2
Iodide SCHEMBL11594153 0.73 ALDH1A1 (0.48) TP53SMN1; SMN2HTR2A
Bromide SCHEMBL11513184 0.73 ALDH1A1 (0.48) TP53SMN1; SMN2HTR2A
Butylbenzyl SCHEMBL10925942 0.72 SIGMAR1 (0.57) KCNH2SIGMAR1OPRM1DRD3CHRM2
Butylbenzyl SCHEMBL363180 0.72 SIGMAR1 (0.57) KCNH2SIGMAR1OPRM1DRD3CHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10131824-B2 Adhesive composition, adhesive sheet, and method for producing semiconductor device LINTEC CORPORATION (JP) 2018-11-20 US disclosed
EP-2821817-B1 LAMINATE SHARP KK (JP) 2018-06-20 EP disclosed
US-9862167-B2 Laminate including antireflective moth-eye film and protection film SHARP KABUSHIKI KAISHA (JP) 2018-01-09 US disclosed
US-20160160094-A1 Adhesive Composition, Adhesive Sheet, and Method for Producing Semiconductor Device LINTEC CORPORATION (JP) 2016-06-09 US disclosed
EP-2345679-B1 METHOD FOR PRODUCING GRAFT COPOLYMER, GRAFT COPOLYMER OBTAINED BY THE METHOD, RUBBER COMPOSITION CONTAINING THE GRAFT COPOLYMER, AND TIRE BRIDGESTONE CORP (JP) 2016-04-27 EP disclosed
EP-2821817-A1 LAMINATE Sharp Kabushiki Kaisha (JP) 2015-01-07 EP disclosed
US-20140342121-A1 LAMINATE LINTEC CORPORATION (JP) 2014-11-20 US disclosed
US-8598272-B2 Compatibilizer and blend polymer composition including the same CHI MEI CORPORATION (TW) 2013-12-03 US disclosed
EP-1767564-B2 POLYMER, A METHOD FOR PRODUCING THE POLYMER, AND A CEMENT ADMIXTURE USING THE SAME NIPPON CATALYTIC CHEM IND (JP) 2013-09-25 EP disclosed
EP-1619211-B1 PROCESS FOR PRODUCTION OF LIVING-RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL CO LTD (JP) 2012-10-17 EP disclosed
US-7291690-B2 Process for production of living radical polymers and polymers OTSUKA CHEMICAL CO., LTD. (JP) 2007-11-06 US disclosed
EP-1541592-B1 PROCESS FOR PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OBTAINED THEREFROM OTSUKA CHEMICAL CO LTD (JP) 2007-05-02 EP disclosed
US-20070073015-A1 Polymer, a method for producing the polymer, and a cement admixture using the same NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-29 US disclosed
EP-1767564-A2 Polymer, a method for producing the polymer, and a cement admixture using the same NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-28 EP disclosed
US-20060199927-A1 Process for production of living-radical polymers and polymers Outdoor Wireless Networks LLC 2006-09-07 US disclosed
US-20060167199-A1 Process for produciton of living radical polymers and polymers OTSUKA CHEMICAL CO., LTD. (JP) 2006-07-27 US disclosed
US-20060135711-A1 Process for the production of living radical polymers and polymers OTSUKA CHEMICAL CO., LTD. (JP) 2006-06-22 US disclosed
EP-1619211-A1 PROCESS FOR PRODUCTION OF LIVING-RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2006-01-25 EP disclosed
EP-1595894-A1 PROCESS FOR THE PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2005-11-16 EP disclosed
EP-1541592-A1 PROCESS FOR PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2005-06-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060135711-A1 Process for the production of living radical polymers and polymers CBR3, CBR1, CCNT1 KCNH2 492/4885SIGMAR1 1237/4885OPRM1 896/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.