SCHEMBL467540

SCHEMBL467540

OCCc1ccnnn1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28213591 0.87 CXCR4 (0.32)
SCHEMBL28717378 0.84 CA2 (0.33)
SCHEMBL2994011 0.81
SCHEMBL28498078 0.81 TSHR (0.36)
SCHEMBL2923103 0.77
SCHEMBL5451479 0.77
SCHEMBL6768548 0.77
SCHEMBL8766235 0.77
SCHEMBL27850208 0.75
SCHEMBL29921453 0.75 KEAP1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 179 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12098276-B2 Etch resistant coatings for acid sensitive stones LATICRETE INTERNATIONAL, INC. (US) 2024-09-24 US claimed
CN-114715992-B Desulfurizing deodorant and preparation method and application thereof 中国石油天然气股份有限公司 2023-08-22 CN claimed
CN-111892677-B Flame-retardant organic glass and preparation method thereof 四川金象赛瑞化工股份有限公司 2022-08-23 CN claimed
CN-114715992-A Desulfurization deodorant and preparation method and application thereof 中国石油天然气股份有限公司 2022-07-08 CN claimed
CN-112294975-A Contact allergen reagent combination and application thereof 上海市皮肤病医院 2021-02-02 CN claimed
US-20200369882-A1 Etch Resistant Coatings for Acid Sensitive Stones LATICRETE INTERNATIONAL, INC. 2020-11-26 US claimed
CN-111892677-A Flame-retardant organic glass and preparation method thereof 四川金象赛瑞化工股份有限公司 2020-11-06 CN claimed
CN-107866147-B Preparation method of offshore oilfield liquid composite desulfurizer 中海油天津化工研究设计院有限公司 2020-10-30 CN claimed
CN-102190923-B Treatment solution, ink group and image forming method FUJI FILM CORP. (JP) 2015-08-26 CN claimed
CN-100456932-C Stable, low free formaldehyde, synergistic antimicrobial compositions of aldehyde donors and dehydroacetic acid LONZA AG (US) 2009-02-04 CN claimed
CN-1684585-A Synergistic antimicrobial compositions of stable aldehyde donors and dehydroacetic acid with low free formyl content LONZA AG (US) 2005-10-19 CN claimed
US-5368778-A Cleaner for thermostatic water bath WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1994-11-29 US claimed
US-5364649-A Copper-triethanolamine complex, isothiazolone compound, formaldehyde releasing compound ROSSMOORE LEONARD A (US) 1994-11-15 US claimed
US-5230811-A Mixture of triazine compound, surfactant and hydroxyamine compound SHIMOTOMAI NAOMASA (JP) 1993-07-27 US claimed
US-12567515-B2 Conductive film, touch panel, photosensitive resin composition, and method of manufacturing conductive film FUJIFILM CORPORATION (JP) 2026-03-03 US disclosed
CN-115335925-B Conductive film, touch panel, photosensitive resin composition, and method for producing conductive film 富士胶片株式会社 2025-05-27 CN disclosed
CN-113316758-B Touch panel and method for manufacturing touch panel 富士胶片株式会社 2024-11-12 CN disclosed
US-5364649-A Copper-triethanolamine complex, isothiazolone compound, formaldehyde releasing compound ROSSMOORE LEONARD A (US) 1994-11-15 US disclosed
EP-0347815-B1 CLEANER FOR THERMOSTATIC WATER BATH SAN-AI OIL CO., LTD. (JP) 1993-09-01 EP disclosed
EP-0347815-A2 Cleaner for thermostatic water bath SAN-AI OIL CO., LTD. (JP) 1989-12-27 EP disclosed