SCHEMBL4677005

SCHEMBL4677005

[O]CC(=O)OC1CCCC1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 2/20 0.52
CYP2C19 P33261 1/20 0.52
HTT P42858 2/20 0.48
CYP19A1 P11511 2/20 0.47
EPHX1 P07099 2/20 0.45
CA12 O43570 2/20 0.39
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
CA9 Q16790 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.38
ALDH1A1 P00352 3/20 0.36
KDM4E B2RXH2 3/20 0.36
HPGD P15428 2/20 0.36
HSD17B10 Q99714 1/20 0.36
APOBEC3A P31941 1/20 0.35
APOBEC3G Q9HC16 1/20 0.35
LMNA P02545 2/20 0.35
RAB9A P51151 1/20 0.35
MIF P14174 1/20 0.35
MMP1 P03956 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5439382 0.98 CYP2C19 (0.55) NAAACYP2C19HTTCYP19A1EPHX1
SCHEMBL4672313 0.98 CYP2C19 (0.55) NAAACYP2C19HTTCYP19A1EPHX1
SCHEMBL4672513 0.95
SCHEMBL4676900 0.90
SCHEMBL240891 0.82 NAAA (0.53) NAAACYP2C19HTTCYP19A1EPHX1
SCHEMBL207015 0.82 NAAA (0.64) NAAACYP2C19HTTCYP19A1EPHX1
SCHEMBL9616044 0.81 CYP2C19 (0.53) NAAACYP2C19HTTCYP19A1EPHX1
SCHEMBL242936 0.80 CYP2C19 (0.57) NAAACYP2C19HTTCYP19A1EPHX1
SCHEMBL4677009 0.80 NAAA (0.52) NAAACYP2C19HTTCYP19A1EPHX1
SCHEMBL7568980 0.80 NAAA (0.66) NAAACYP2C19HTTCYP19A1EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1095935-B1 6-Hydroxy-5,6-dihydrouracils as herbicides SUMITOMO CHEMICAL CO (JP) 2008-12-17 EP disclosed
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 US disclosed
US-7005230-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-02-28 US disclosed
EP-1101761-B1 Process for producing 3-phenyluracil compounds SUMITOMO CHEMICAL CO (JP) 2005-08-17 EP disclosed
US-20040146802-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2004-07-29 US disclosed
US-6410484-B1 ACTIVE MATERIAL; CONTROLLING WEEDS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-06-25 US disclosed
US-6339155-B1 Process for producing 3-phenyluracil compounds SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-15 US disclosed
EP-1101761-A2 Process for producing 3-phenyluracil compounds SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-05-23 EP disclosed
EP-1095935-A1 6-Hydroxy-5,6-dihydrouracils as herbicides SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-05-02 EP disclosed
US-5521145-A Iminothiazoline derivatives and herbicides containing them as active ingredients SUMITOMO CHEMICAL COMPANY, LTD. (JP) 1996-05-28 US disclosed
EP-0683160-A1 Iminothiazoline derivatives and herbicides containing them as active ingredients SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1995-11-22 EP disclosed