SCHEMBL4712809

SCHEMBL4712809

CCC(O)CN(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12853844 0.90
SCHEMBL79622 0.88 TSHR (0.37)
SCHEMBL15509645 0.88 KDM4E (0.35)
SCHEMBL17383350 0.87 KDM4E (0.34)
SCHEMBL4239566 0.81
SCHEMBL7582522 0.79
SCHEMBL18159896 0.79 LMNA (0.30)
SCHEMBL15834191 0.79 KDM4E (0.32)
SCHEMBL19601301 0.79 ABCB1 (0.35)
SCHEMBL29696240 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2008022437-A1 METHOD FOR CAPTURING CARBON DIOXIDE FROM GAS STREAMS UNIVERSITY OF REGINA (CA) 2008-02-28 WO claimed
US-7074258-B2 Process for dehydrating gas BP EXPLORATION OPERATING COMPANY LIMITED (GB) 2006-07-11 US claimed
EP-1372824-B1 PROCESS FOR DEHYDRATING GAS BP EXPLORATION OPERATING (GB) 2004-08-11 EP claimed
US-20040139855-A1 Process for dehydrating gas BP EXPLORATION OPERATING COMPANY LIMITED (GB) 2004-07-22 US claimed
CN-122038059-A Cleaning composition for removing post-etch residues 恩特格里斯公司 2026-05-15 CN disclosed
CN-112533967-B Oil-in-water droplet type emulsion of active energy ray-curable resin composition and thermosensitive recording material 日本化药株式会社 2023-09-15 CN disclosed
EP-4180417-A1 ALKOXIDE COMPOUND, THIN FILM-FORMING MATERIAL, AND METHOD FOR MANUFACTURING THIN FILM ADEKA CORPORATION (JP) 2023-05-17 EP disclosed
CN-107325009-B Stabilization of quaternary trialkylalkanolamines using novel amines 亨斯迈石油化学有限责任公司 2022-03-18 CN disclosed
EP-3901326-A1 RAW MATERIAL FOR FORMING THIN FILM FOR ATOMIC LAYER DEPOSITION, PRODUCTION METHOD OF THIN FILM, AND ALKOXIDE COMPOUND ADEKA CORPORATION (JP) 2021-10-27 EP disclosed
CN-112533967-A Oil-in-water emulsion of active energy ray-curable resin composition and thermal recording material 日本化药株式会社 2021-03-19 CN disclosed
US-10790187-B2 Post-etch residue removal for advanced node beol processing ENTEGRIS, INC. (US) 2020-09-29 US disclosed
US-10577567-B2 Cleaning compositions for removing post etch residue ENTEGRIS, INC. (US) 2020-03-03 US disclosed
US-20120129240-A1 BUFFER COMPOUNDS SACHEM, INC. 2012-05-24 US disclosed
EP-2357173-A1 New alkyne compounds with MCH-antagonistic activity and medicaments containing them Boehringer Ingelheim Pharma GmbH & Co. KG (DE) 2011-08-17 EP disclosed
US-20090124602-A1 KINASE INHIBITORS VERTEX PHARMACEUTICALS INCORPORATED 2009-05-14 US disclosed
WO-2008022437-A1 METHOD FOR CAPTURING CARBON DIOXIDE FROM GAS STREAMS UNIVERSITY OF REGINA (CA) 2008-02-28 WO disclosed
EP-1797868-A1 Cosmetic composition comprising a (thio)urethane/(thio)urea copolymer capable of forming at least 3 hydrogen bonds, and process for cosmetic treatment L'Oréal (FR) 2007-06-20 EP disclosed
US-7074258-B2 Process for dehydrating gas BP EXPLORATION OPERATING COMPANY LIMITED (GB) 2006-07-11 US disclosed
EP-1372824-B1 PROCESS FOR DEHYDRATING GAS BP EXPLORATION OPERATING (GB) 2004-08-11 EP disclosed
US-20040139855-A1 Process for dehydrating gas BP EXPLORATION OPERATING COMPANY LIMITED (GB) 2004-07-22 US disclosed