Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR1 | O14842 | 11/20 | 0.59 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.50 |
| ▸ | MAPT | P10636 | 2/20 | 0.50 |
| ▸ | FFAR4 | Q5NUL3 | 2/20 | 0.50 |
| ▸ | CA1 | P00915 | 1/20 | 0.50 |
| ▸ | CA2 | P00918 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
| ▸ | NPC1 | O15118 | 1/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.50 |
| ▸ | RAB9A | P51151 | 1/20 | 0.50 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.50 |
| ▸ | RELA | Q04206 | 1/20 | 0.50 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL472311 | 0.89 | ALDH1A1 (0.61) | FFAR1ALDH1A1MAPK1MAPTLMNA | |
| SCHEMBL28008810 | 0.86 | ALDH1A1 (0.52) | ALDH1A1MAPK1MAPTL3MBTL1NPC1 | |
| SCHEMBL8136098 | 0.84 | ALDH1A1 (0.59) | ALDH1A1MAPK1MAPTLMNANPC1 | |
| SCHEMBL5593599 | 0.83 | CYP1A2 (0.51) | FFAR1KEAP1ALDH1A1MAPTFFAR4 | |
| SCHEMBL69746 | 0.82 | FFAR1 (0.81) | FFAR1KEAP1MAPK1FFAR4CA1 | |
| SCHEMBL27278134 | 0.82 | ALDH1A1 (0.49) | ALDH1A1MAPK1MAPTCA1CA2 | |
| SCHEMBL1469760 | 0.82 | ALDH1A1 (0.46) | FFAR1ALDH1A1MAPK1MAPTNPC1 | |
| SCHEMBL14732640 | 0.82 | FFAR1 (0.67) | FFAR1KEAP1ALDH1A1MAPTFFAR4 | |
| Hydrochloric Acid SCHEMBL25264643 | 0.80 | FFAR1 (0.77) | FFAR1KEAP1MAPK1FFAR4CA1 | |
| SCHEMBL14610940 | 0.80 | FFAR1 (0.59) | FFAR1KEAP1ALDH1A1FFAR4CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 142 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0022188-B1 | CO-INITIATOR COMPOSITIONS FOR PHOTOPOLYMERIZATION CONTAINING 3-ACYL-SUBSTITUTED COUMARINS, PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOGRAPHIC ELEMENT | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1984-10-03 | — | — | EP | claimed |
| CN-115215756-B | Organic fluorescent probe with endoplasmic reticulum targeting function, and preparation method and application thereof | 华南理工大学 | 2023-10-27 | — | — | CN | disclosed |
| CN-115215756-A | Organic fluorescent probe with endoplasmic reticulum targeting function and preparation method and application thereof | 华南理工大学 | 2022-10-21 | — | — | CN | disclosed |
| EP-2492746-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2019-11-20 | — | — | EP | disclosed |
| CN-105607426-B | Polymer, chemical amplification negative resist composition and pattern forming method | SHIN ETSU CHEMICAL COMPANY (JP) | 2019-11-01 | — | — | CN | disclosed |
| EP-2492747-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2018-11-07 | — | — | EP | disclosed |
| EP-2270596-B1 | Positive resist compostion and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-07-25 | — | — | EP | disclosed |
| CN-104330955-B | For the chemical-amplification positive anti-corrosion agent composition and patterning method of EB or EUV lithographic printings | 信越化学工业株式会社 | 2018-05-25 | — | — | CN | disclosed |
| US-RE46765-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-RE46736-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| EP-1104420-B1 | SUBSTITUTED 1,8-NAPHTHYRIDIN-4(1H)-ONES AS PHOSPHODIESTERASE 4 INHIBITORS | PFIZER PROD INC (US) | 2002-12-18 | — | — | EP | disclosed |
| CN-1312810-A | Substituted 1,8-naphthyridin-4(1H)-ones as phosphodiesterase 4 inhibitors | PFIZER PROD INC (US) | 2001-09-12 | — | — | CN | disclosed |
| EP-1104420-A1 | SUBSTITUTED 1,8-NAPHTHYRIDIN-4(1H)-ONES AS PHOSPHODIESTERASE 4 INHIBITORS | Pfizer Products Inc. (US) | 2001-06-06 | — | — | EP | disclosed |
| US-6174895-B1 | USEFUL IN TREATMENT OF RESPIRATORY, ALLERGIC, RHEUMATOID, BODY WEIGHT REGULATION, INFLAMMATORY AND CENTRAL NERVOUS SYSTEM DISORDERS SUCH AS ASTHMA, CHRONIC OBSTRUCTIVE PULMONARY DISEASE, ADULT RESPIRATORY DISEASES SYNDROME, FIBROSIS | PFIZER INC. | 2001-01-16 | — | — | US | disclosed |
| US-6069149-A | ANTIALLERGENS, ANTIINFLAMMATORY AGENTS | TERUMO KABUSHIKI KAISHA (JP) | 2000-05-30 | — | — | US | disclosed |
| WO-2000009504-A1 | SUBSTITUTED 1,8-NAPHTHYRIDIN-4(1H)-ONES AS PHOSPHODIESTERASE 4 INHIBITORS | PFIZER PRODUCTS INC. (US) | 2000-02-24 | — | — | WO | disclosed |
| EP-0894797-A1 | NOVEL AMIDE DERIVATIVES AND INTERMEDIATES FOR THE SYNTHESIS THEREOF | TERUMO KABUSHIKI KAISHA (JP) | 1999-02-03 | — | — | EP | disclosed |
| US-5414108-A | From a Meldrum's acid derivative | BIOGAL GYOGYSZERGRAR (HU) | 1995-05-09 | — | — | US | disclosed |
| US-5350872-A | Decyclization and decarboxylation of a 1,3-dioxane-4,6-dione | BIOGAL GYOGYSZERGRAR (HU) | 1994-09-27 | — | — | US | disclosed |
| EP-0578850-A1 | Process for the preparation of carboxylic acids and derivatives of them | BIOGAL GYOGYSZERGYAR (HU) | 1994-01-19 | — | — | EP | disclosed |