SCHEMBL4725794

SCHEMBL4725794

BrCC1=C2CCC(C1)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL146172 0.76
SCHEMBL1056434 0.76
SCHEMBL4115348 0.76
SCHEMBL9064044 0.74
SCHEMBL4291749 0.71
SCHEMBL10454169 0.69 NOS1 (0.31)
SCHEMBL9484394 0.69 NOS1 (0.31)
SCHEMBL22194101 0.67
SCHEMBL1805649 0.64
SCHEMBL10583341 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109942501-B Polybenzotriazole-ionic liquid copolymer containing anchor group and preparation method and application thereof 西北工业大学深圳研究院 2022-04-19 CN claimed
CN-109942501-B Polybenzotriazole-ionic liquid copolymer containing anchor group and preparation method and application thereof 西北工业大学深圳研究院 2022-04-19 CN disclosed
WO-2008014313-A2 A PROCESS FOR FORMING PERFLUORINATED-ALKYL SULFONAMIDE SUBSTITUTED NORBORNENE-TYPE MONOMERS PROMERUS LLC (US) 2008-01-31 WO disclosed
US-20080027246-A1 Process for forming perfluorinated-alkyl sulfonamide substituted norbornene-type monomers PROMERUS, LLC 2008-01-31 US disclosed
US-5281510-A Photosensitive elastomeric composition NIPPON ZEON CO., LTD. (JP) 1994-01-25 US disclosed
US-4980269-A FLEXOGRAPHY PRINTING PLATES NIPPON ZEON CO., LTD. (JP) 1990-12-25 US disclosed