SCHEMBL47316

SCHEMBL47316

C=CC1(OC(=O)C(=C)C)CCCCCCC1

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL47318 1.00 ALDH1A1 (0.35) ALDH1A1
SCHEMBL47317 0.98 ALDH1A1 (0.37) ALDH1A1
SCHEMBL87781 0.90 ALDH1A1 (0.39) ALDH1A1
SCHEMBL21361190 0.87 ALDH1A1 (0.37) ALDH1A1
Methacrylic Acid SCHEMBL728730 0.87 ALDH1A1 (0.37) ALDH1A1
SCHEMBL24208042 0.84 ALDH1A1 (0.34) ALDH1A1
SCHEMBL23030202 0.82 TSHR (0.34) ALDH1A1
SCHEMBL4890569 0.82 MEN1 (0.30) ALDH1A1
SCHEMBL5122025 0.82 MEN1 (0.30) ALDH1A1
SCHEMBL24208040 0.82 ALDH1A1 (0.33) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11747726-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-09-05 US disclosed
WO-2012002470-A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND JSR株式会社 (JP) 2012-01-05 WO disclosed