Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL47316 | 0.98 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL47318 | 0.98 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL87781 | 0.92 | ALDH1A1 (0.39) | ALDH1A1TSHR | |
| Methacrylic Acid SCHEMBL728730 | 0.89 | ALDH1A1 (0.37) | ALDH1A1TSHR | |
| SCHEMBL21361190 | 0.85 | ALDH1A1 (0.37) | ALDH1A1TSHR | |
| SCHEMBL9421672 | 0.82 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL22941769 | 0.82 | SCN1A (0.33) | ALDH1A1 | |
| SCHEMBL23030259 | 0.82 | TSHR (0.35) | ALDH1A1TSHR | |
| SCHEMBL21847231 | 0.82 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL24208042 | 0.81 | ALDH1A1 (0.34) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240241440-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| US-20240241441-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| WO-2024127808-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2024-06-20 | — | — | WO | disclosed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027905-A1 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-20230400769-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20180024433-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-20180024433-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-20180022916-A1 | METHOD OF PREPARING POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-20170369698-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-12-28 | — | — | US | disclosed |
| US-20170369697-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-12-28 | — | — | US | disclosed |
| US-20170226250-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-10 | — | — | US | disclosed |
| US-20170097567-A1 | METHOD FOR PRODUCING POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-20160229940-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160168296-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-16 | — | — | US | disclosed |
| WO-2012002470-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND | JSR株式会社 (JP) | 2012-01-05 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | ALDH1A1 382/4885TSHR 3135/4885 |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | C1S, C1R, CRY2 | ALDH1A1 3079/4885TSHR 839/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.