SCHEMBL4740300

SCHEMBL4740300

CCC(=O)OCCCCC(CC)CC

nearest known ligand 0.59

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.59
TSHR P16473 2/20 0.44
ATM Q13315 2/20 0.44
CYP3A4 P08684 2/20 0.44
TDP1 Q9NUW8 1/20 0.44
HTT P42858 1/20 0.44
RAD52 P43351 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
RECQL P46063 1/20 0.37
PRSS1 P07477 1/20 0.37
PRSS2 P07478 1/20 0.37
PRSS3 P35030 1/20 0.37
FAAH O00519 1/20 0.37
CA2 P00918 3/20 0.36
HTR2C P28335 1/20 0.36
ALDH1A1 P00352 1/20 0.36
DGKA P23743 1/20 0.35
HCAR2 Q8TDS4 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30166467 0.94 NAAA (0.55) NAAATSHRATMCYP3A4TDP1
SCHEMBL410872 0.86 NAAA (0.53) NAAATSHRATMCYP3A4TDP1
SCHEMBL4741981 0.85 NAAA (0.48) NAAATSHRATMCYP3A4TDP1
SCHEMBL28412114 0.83 NAAA (0.63) NAAATSHRATMCYP3A4TDP1
SCHEMBL50185 0.82 NAAA (0.81) NAAATSHRATMHTTRAD52
SCHEMBL2957097 0.82 TSHR (0.46) NAAATSHRATMCYP3A4TDP1
SCHEMBL28159744 0.82 ALDH1A1 (0.56) NAAATSHRATMCYP3A4TDP1
SCHEMBL8985716 0.82 NAAA (0.61) NAAATDP1HTTRAD52NPSR1
SCHEMBL28399409 0.81 NAAA (0.55) NAAATSHRATMCYP3A4TDP1
SCHEMBL28388443 0.81 NAAA (0.60) NAAATSHRHTTRAD52NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2008098189-A1 PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-08-14 WO disclosed
EP-1558654-A4 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF FUJIFILM ELECTRONIC MATERIALS (US) 2006-04-05 EP disclosed
EP-1558654-A2 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF Fujifilm Electronic Materials USA, Inc. (US) 2005-08-03 EP disclosed
WO-2004040371-A2 NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2004-05-13 WO disclosed