⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5427965 | 0.87 | ALDH1A1 (0.36) | — | |
| SCHEMBL9634959 | 0.81 | CA1 (0.39) | — | |
| SCHEMBL7924470 | 0.80 | POLB (0.33) | — | |
| Methyl 2-Methylbutanoate SCHEMBL8954886 | 0.79 | — | — | |
| Methyl 2-Methylbutanoate SCHEMBL283261 | 0.79 | — | — | |
| Methyl 2-Methylbutanoate SCHEMBL1869834 | 0.79 | CA1 (0.46) | — | |
| Methyl 2-Methylbutanoate SCHEMBL108113 | 0.79 | — | — | |
| SCHEMBL11746994 | 0.78 | ALDH1A1 (0.40) | — | |
| SCHEMBL332266 | 0.78 | ALDH1A1 (0.36) | — | |
| SCHEMBL17394852 | 0.78 | CA1 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10663863-B2 | Method of producing layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2020-05-26 | — | — | US | claimed |
| US-10312074-B2 | Method of producing layer structure, layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2019-06-04 | — | — | US | claimed |
| US-20170115572-A1 | METHOD OF PRODUCING LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2017-04-27 | — | — | US | claimed |
| US-20160126088-A1 | METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2016-05-05 | — | — | US | claimed |
| US-20230129965-A1 | HYDROPHILIC AND OLEOPHOBIC POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-04-27 | — | — | US | disclosed |
| US-10663863-B2 | Method of producing layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2020-05-26 | — | — | US | disclosed |
| CN-105575775-B | Layer structure and the method and semiconductor device for manufacturing its method, forming pattern | 三星SDI株式会社 | 2019-08-13 | — | — | CN | disclosed |
| US-10312074-B2 | Method of producing layer structure, layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2019-06-04 | — | — | US | disclosed |
| US-20180030175-A1 | POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-02-01 | — | — | US | disclosed |
| CN-106610567-A | Method for producing layer structure, and method for forming patterns | 三星SDI株式会社 | 2017-05-03 | — | — | CN | disclosed |
| US-20170115572-A1 | METHOD OF PRODUCING LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2017-04-27 | — | — | US | disclosed |
| US-20160126088-A1 | METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2016-05-05 | — | — | US | disclosed |
| WO-2008088217-A2 | METHOD FOR PROTECTING A HEAT EXCHANGER AGAINST CORROSION, AND HEAT EXCHANGER AND LIQUID COMPOSITION FOR PROTECTING A HEAT EXCHANGER AGAINST CORROSION | TRIPLE E B.V. (NL) | 2008-07-24 | — | — | WO | disclosed |
| EP-1812381-A1 | ETHYLENICALLY UNSATURATED GROUP-CONTAINING ISOCYANATE COMPOUND AND PROCESS FOR PRODUCING THE SAME, AND REACTIVE MONOMER, REACTIVE (METH)ACRYLATE POLYMER AND ITS USE | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2007-08-01 | — | — | EP | disclosed |
| WO-2006049264-A1 | ETHYLENICALLY UNSATURATED GROUP-CONTAINING ISOCYANATE COMPOUND AND PROCESS FOR PRODUCING THE SAME, AND REACTIVE MONOMER, REACTIVE (METH)ACRYLATE POLYMER AND ITS USE | SHOWA DENKO K.K. (JP) | 2006-05-11 | — | — | WO | disclosed |