Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | MGAM | O43451 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | SI | P14410 | 1/20 | 0.33 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.33 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5427965 | 0.85 | ALDH1A1 (0.36) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| SCHEMBL17710651 | 0.82 | SMN1; SMN2 (0.39) | ALDH1A1LMNAHSD17B10ALOX15KMT2A | |
| SCHEMBL13750075 | 0.82 | ALDH1A1 (0.38) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| SCHEMBL17710662 | 0.80 | — | — | |
| SCHEMBL27643862 | 0.79 | ALDH1A1 (0.43) | ALDH1A1LMNAHSD17B10L3MBTL1SMN1; SMN2 | |
| SCHEMBL17710653 | 0.79 | CA1 (0.44) | ALDH1A1TP53MAPK1 | |
| SCHEMBL7924470 | 0.78 | POLB (0.33) | ALDH1A1LMNAHSD17B10KMT2A | |
| SCHEMBL4740532 | 0.78 | — | — | |
| SCHEMBL10483850 | 0.78 | CA2 (0.39) | ALDH1A1LMNAHSD17B10ALOX15MGAM | |
| SCHEMBL118486 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 537 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10705424-B2 | Negative-working photoresist compositions for laser ablation and use thereof | MERCK PATENT GMBH (DE) | 2020-07-07 | — | — | US | claimed |
| US-10663863-B2 | Method of producing layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2020-05-26 | — | — | US | claimed |
| US-10312074-B2 | Method of producing layer structure, layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2019-06-04 | — | — | US | claimed |
| CN-104704013-B | The manufacture method and coating composition of fluorinated copolymer solution | 旭硝子株式会社 | 2017-07-21 | — | — | CN | claimed |
| US-20170115572-A1 | METHOD OF PRODUCING LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2017-04-27 | — | — | US | claimed |
| US-20160126088-A1 | METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2016-05-05 | — | — | US | claimed |
| CN-103289285-B | Segmented copolymer and relative method | ROHM AND HAAS ELECTRONIC MATERIALS CO., LTD. (US) | 2016-03-30 | — | — | CN | claimed |
| CN-103304950-B | The block copolymer composition of mixing | ROHM AND HAAS ELECTRONIC MATERIALS CO., LTD. (US) | 2015-11-25 | — | — | CN | claimed |
| CN-103319931-B | Thermal annealing process | ROHM & HAAS ELECT MAT | 2015-06-17 | — | — | CN | claimed |
| CN-103571252-B | Thermal annealing process | ROHM & HAAS ELECT MAT | 2015-06-17 | — | — | CN | claimed |
| US-20050256241-A1 | Metal filler particles dispersed in solvent-free hybrid epoxy polymer matrix; electronics; semiconductors; heat sinks | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-11-17 | — | — | US | claimed |
| US-6652665-B1 | Immersing and aggitating in preheated solution containing quaternary ammonium fluoride and hydrophobic nonhydroxylic aprotic solvent | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-11-25 | — | — | US | claimed |
| EP-0948553-B1 | FRACTIONATED NOVOLAK RESIN FROM CRESOL-FORMALDEHYDE REACTION MIXTURE AND PHOTORESIST COMPOSITION THEREFROM | CLARIANT FINANCE BVI LTD (VG) | 2001-04-11 | — | — | EP | claimed |
| EP-0763065-B1 | USE OF GLYCOL ETHER COMPOUNDS FOR THE PRODUCTION OF POLYOLEFIN CATALYSTS AND SUPPORTS | GRACE W R & CO (US) | 1999-08-18 | — | — | EP | claimed |
| EP-0766717-A1 | AT LEAST THREE-PART COATING AGENT, PROCESS FOR PRODUCING IT AND ITS USE | BASF Lacke und Farben AG (DE) | 1997-04-09 | — | — | EP | claimed |
| EP-0763065-A1 | USE OF GLYCOL ETHER COMPOUNDS FOR THE PRODUCTION OF POLYOLEFIN CATALYSTS AND SUPPORTS | W.R. Grace & Co.-Conn. (US) | 1997-03-19 | — | — | EP | claimed |
| US-5599762-A | MIXING WATER-CONTAINING OXIDE HYDROGEL WITH LIQUID GLYCOL ETHER ESTER, REMOVING WATER BY AZEOTROPIC DISTILLATION TO FORM XEROGEL, REMOVING LIQUID | W. R. GRACE & CO.-CONN. (US) | 1997-02-04 | — | — | US | claimed |
| US-5576262-A | CHROMIUM OXIDE GELS AND AZEOTROPIC DISTILLATION OF MIXTURES WITH SOLVENTS | W. R. GRACE & CO.-CONN. (US) | 1996-11-19 | — | — | US | claimed |
| WO-1995035348-A1 | AT LEAST THREE-PART COATING AGENT, PROCESS FOR PRODUCING IT AND ITS USE | BASF LACKE + FARBEN AG (DE) | 1995-12-28 | — | — | WO | claimed |
| WO-1995033777-A1 | USE OF GLYCOL ETHER COMPOUNDS FOR THE PRODUCTION OF POLYOLEFIN CATALYSTS AND SUPPORTS | W.R. GRACE & CO.-CONN. (US) | 1995-12-14 | — | — | WO | claimed |