Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGKA | P23743 | 1/20 | 0.68 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.57 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.57 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.57 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | NAAA | Q02083 | 1/20 | 0.52 |
| ▸ | PAM | P19021 | 2/20 | 0.52 |
| ▸ | HTR2C | P28335 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2485452 | 1.00 | DGKA (0.68) | DGKAPRSS1PRSS2PRSS3DNM1 | |
| SCHEMBL129577 | 1.00 | DGKA (0.68) | DGKAPRSS1PRSS2PRSS3DNM1 | |
| SCHEMBL7839213 | 1.00 | DGKA (0.68) | DGKAPRSS1PRSS2PRSS3DNM1 | |
| SCHEMBL7839840 | 1.00 | DGKA (0.68) | DGKAPRSS1PRSS2PRSS3DNM1 | |
| SCHEMBL8453125 | 1.00 | DGKA (0.68) | DGKAPRSS1PRSS2PRSS3DNM1 | |
| SCHEMBL8459151 | 1.00 | DGKA (0.68) | DGKAPRSS1PRSS2PRSS3DNM1 | |
| SCHEMBL129849 | 0.98 | DGKA (0.64) | DGKAPRSS1PRSS2PRSS3DNM1 | |
| SCHEMBL7838000 | 0.94 | DGKA (0.71) | DGKAPRSS1PRSS2PRSS3DNM1 | |
| SCHEMBL1888899 | 0.94 | DGKA (0.71) | DGKAPRSS1PRSS2PRSS3DNM1 | |
| SCHEMBL7839300 | 0.94 | DGKA (0.71) | DGKAPRSS1PRSS2PRSS3DNM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080199805-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS. U.S.A., INC. | 2008-08-21 | — | — | US | disclosed |
| WO-2008098189-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-14 | — | — | WO | disclosed |
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | disclosed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | disclosed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | disclosed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | disclosed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | disclosed |
| EP-0751133-B1 | Pyrimidine compound, and liquid crystal composition and liquid crystal element using the same | MITSUI CHEMICALS INC (JP) | 2001-09-12 | — | — | EP | disclosed |
| US-5770108-A | HIGH SPEED RESPONSE, MOLECULAR ORIENTATION, HIGH CONTRAST, RECEPTIVITY | MITSUI TOATSU CHEMICALS, INC. (JP) | 1998-06-23 | — | — | US | disclosed |
| EP-0751133-A1 | Pyrimidine compound, and liquid crystal composition and liquid crystal element using the same | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1997-01-02 | — | — | EP | disclosed |
| US-4333868-A | Phosphite ester stabilizers | CIBA-GEIGY CORPORATION (US) | 1982-06-08 | — | — | US | disclosed |
| US-4132702-A | Phenol esters and amides and polymers stabilized therewith | CIBA-GEIGY CORPORATION (US) | 1979-01-02 | — | — | US | disclosed |