SCHEMBL4742227

SCHEMBL4742227

[CH2]C(C)C(=O)OC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.48

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 6/20 0.48
CYP17A1 P05093 5/20 0.48
NAAA Q02083 1/20 0.39
NPSR1 Q6W5P4 1/20 0.38
ALDH1A1 P00352 4/20 0.37
EPHX1 P07099 1/20 0.37
NPC1 O15118 1/20 0.37
MAPT P10636 1/20 0.34
EPHX2 P34913 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4743415 0.85 CYP19A1 (0.46) CYP19A1CYP17A1NAAANPSR1ALDH1A1
SCHEMBL14673993 0.84 CYP17A1 (0.50) CYP19A1CYP17A1NAAANPSR1ALDH1A1
SCHEMBL9608681 0.84 CYP19A1 (0.50) CYP19A1CYP17A1NAAANPSR1ALDH1A1
SCHEMBL27437399 0.84 CYP19A1 (0.50) CYP19A1CYP17A1NAAANPSR1ALDH1A1
SCHEMBL10613175 0.81 CYP19A1 (0.48) CYP19A1CYP17A1NAAANPSR1ALDH1A1
SCHEMBL11991223 0.81 CYP19A1 (0.48) CYP19A1CYP17A1NAAANPSR1ALDH1A1
SCHEMBL20078523 0.81 CYP19A1 (0.48) CYP19A1CYP17A1NAAANPSR1ALDH1A1
SCHEMBL958155 0.81 CYP19A1 (0.48) CYP19A1CYP17A1NAAANPSR1ALDH1A1
SCHEMBL3217474 0.81 CYP17A1 (0.48) CYP19A1CYP17A1NAAANPSR1ALDH1A1
SCHEMBL6441379 0.81 CYP19A1 (0.48) CYP19A1CYP17A1NAAANPSR1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1558654-A4 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF FUJIFILM ELECTRONIC MATERIALS (US) 2006-04-05 EP claimed
EP-1558654-A2 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF Fujifilm Electronic Materials USA, Inc. (US) 2005-08-03 EP claimed
US-6916543-B2 Copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. (US) 2005-07-12 US claimed
US-20040137362-A1 Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. 2004-07-15 US claimed
WO-2004040371-A2 NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2004-05-13 WO claimed
US-20080199805-A1 PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES FUJIFILM ELECTRONIC MATERIALS. U.S.A., INC. 2008-08-21 US disclosed
WO-2008098189-A1 PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-08-14 WO disclosed
EP-1558654-A4 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF FUJIFILM ELECTRONIC MATERIALS (US) 2006-04-05 EP disclosed
EP-1558654-A2 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF Fujifilm Electronic Materials USA, Inc. (US) 2005-08-03 EP disclosed
US-6916543-B2 Copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. (US) 2005-07-12 US disclosed
US-20040137362-A1 Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. 2004-07-15 US disclosed
WO-2004040371-A2 NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2004-05-13 WO disclosed