SCHEMBL4749537

SCHEMBL4749537

CC(O)[CH]c1ccc(OCCO)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR1I2 O75469 1/20 0.47
ALDH1A1 P00352 4/20 0.47
RECQL P46063 1/20 0.47
SMN1; SMN2 Q16637 2/20 0.44
CYP3A4 P08684 1/20 0.44
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
GAA P10253 1/20 0.41
S1PR1 P21453 1/20 0.39
S1PR3 Q99500 1/20 0.39
CHRNA7 P36544 4/20 0.39
CHRNB2 P17787 3/20 0.39
CHRNB4 P30926 3/20 0.39
CHRNA3 P32297 3/20 0.39
CHRNA4 P43681 3/20 0.39
ADRB2 P07550 1/20 0.38
ADRB1 P08588 1/20 0.38
ADRB3 P13945 1/20 0.38
MAPT P10636 3/20 0.38
HPGD P15428 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Isopropyl Alcohol SCHEMBL2167428 0.81 ALDH1A1 (0.54) NR1I2ALDH1A1RECQLSMN1; SMN2CYP3A4
SCHEMBL623205 0.77 CHRNA7 (0.56) NR1I2ALDH1A1RECQLSMN1; SMN2CYP3A4
SCHEMBL20640468 0.77 ALDH1A1 (0.54) NR1I2ALDH1A1RECQLSMN1; SMN2CYP3A4
SCHEMBL20024728 0.77 ALDH1A1 (0.58) NR1I2ALDH1A1RECQLSMN1; SMN2CYP3A4
SCHEMBL48239 0.76 ALDH1A1 (0.75) NR1I2ALDH1A1RECQLSMN1; SMN2CYP3A4
SCHEMBL28106819 0.76 ALDH1A1 (0.75) NR1I2ALDH1A1RECQLSMN1; SMN2CYP3A4
SCHEMBL18094363 0.75 ALDH1A1 (0.50) ALDH1A1CYP3A4MAPTHPGDKDM4E
SCHEMBL9492825 0.74 ALDH1A1 (0.53) NR1I2ALDH1A1RECQLSMN1; SMN2CYP3A4
Water SCHEMBL29229746 0.73 ALDH1A1 (0.71) NR1I2ALDH1A1RECQLSMN1; SMN2CYP3A4
Ethylene Glycol SCHEMBL11119213 0.73 ALDH1A1 (0.71) NR1I2ALDH1A1RECQLSMN1; SMN2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2008127036-A2 PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN LG CHEM, LTD. (KR) 2008-10-23 WO disclosed