⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL28233467 | 0.97 | TSHR (0.39) | — | |
| SCHEMBL28245647 | 0.97 | TSHR (0.39) | — | |
| SCHEMBL12873376 | 0.87 | ALDH1A1 (0.32) | — | |
| SCHEMBL28055762 | 0.87 | ALDH1A1 (0.32) | — | |
| SCHEMBL3793443 | 0.80 | ALDH1A1 (0.35) | — | |
| SCHEMBL31164258 | 0.80 | ALDH1A1 (0.31) | — | |
| SCHEMBL12259526 | 0.80 | ALDH1A1 (0.31) | — | |
| SCHEMBL14982575 | 0.80 | — | — | |
| SCHEMBL475144 | 0.80 | TSHR (0.43) | — | |
| SCHEMBL1121870 | 0.80 | TSHR (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 624 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119542337-A | Preparation method of lithium metal cathode of lithium metal battery, product and application thereof | 华中科技大学 | 2025-02-28 | — | — | CN | claimed |
| EP-3666754-B1 | FULLY CONTINUOUS FLOW PRODUCTION PROCESS FOR DIRECTLY PREPARING ORGANIC PEROXIDE FROM ALCOHOL OR ALKANE | SHANGHAI HYBRID CHEM TECH (CN) | 2023-03-29 | — | — | EP | claimed |
| CN-111320715-B | Ultrahigh molecular weight polyolefin catalyst, and preparation method and application thereof | 叶平山 | 2022-10-04 | — | — | CN | claimed |
| CN-114456113-A | Sulfonic acid derivative compounds as photoacid generators in resist applications | 贺利氏电子化工有限责任公司 | 2022-05-10 | — | — | CN | claimed |
| CN-114335414-A | Method for pre-lithiation of electrode material of lithium ion battery, product and application thereof | 华中科技大学 | 2022-04-12 | — | — | CN | claimed |
| CN-106715398-B | Sulfonic acid derivative compounds as photoacid generators in resist applications | 贺利氏电子化工有限责任公司 | 2021-11-30 | — | — | CN | claimed |
| CN-107810179-B | Sulfonic acid derivative compounds as photoacid generators in resist applications | 贺利氏电子化工有限责任公司 | 2021-10-22 | — | — | CN | claimed |
| US-10976658-B2 | Sulfonic acid derivative compounds as photoacid generators in resist applications | HERAEUS EPURIO LLC (US) | 2021-04-13 | — | — | US | claimed |
| CN-111769323-A | High-hardness polymer battery cell and preparation method thereof | 凤凰新能源(惠州)有限公司 | 2020-10-13 | — | — | CN | claimed |
| US-20200089110-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC | 2020-03-19 | — | — | US | claimed |
| US-20030013831-A1 | NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-16 | — | — | US | claimed |
| US-20020187419-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-12 | — | — | US | claimed |
| WO-2002093263-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | claimed |
| WO-2002092651-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | claimed |
| EP-1238969-A2 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2002-09-11 | — | — | EP | claimed |
| EP-1113005-A1 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2001-07-04 | — | — | EP | claimed |
| US-5770343-A | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-23 | — | — | US | claimed |
| EP-0480287-B1 | Process for the production of relief patterns and relief images | BASF AG (DE) | 1997-01-15 | — | — | EP | claimed |
| EP-0749044-A2 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-12-18 | — | — | EP | claimed |
| US-5279923-A | Generating an acid when exposured to actinic radiation | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1994-01-18 | — | — | US | claimed |