⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1121870 | 0.82 | TSHR (0.43) | — | |
| SCHEMBL475144 | 0.82 | TSHR (0.43) | — | |
| SCHEMBL3315046 | 0.80 | — | — | |
| SCHEMBL475145 | 0.80 | — | — | |
| SCHEMBL66105 | 0.80 | — | — | |
| SCHEMBL14982567 | 0.79 | ALDH1A1 (0.36) | — | |
| SCHEMBL155686 | 0.78 | — | — | |
| SCHEMBL66104 | 0.78 | — | — | |
| SCHEMBL5314775 | 0.78 | — | — | |
| SCHEMBL13564186 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8715913-B2 | Silicon-containing resist underlayer film-forming composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20130137041-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |