SCHEMBL4752548

SCHEMBL4752548

CC(=O)OC(C)OC1CC2C=CC1C2

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.38
KDM4E B2RXH2 2/20 0.34
LMNA P02545 1/20 0.34
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5359771 0.78
SCHEMBL301572 0.75 KDM4E (0.40) ALDH1A1KDM4ELMNATSHR
SCHEMBL13791007 0.75 KDM4E (0.40) ALDH1A1KDM4ELMNATSHR
SCHEMBL1299179 0.75 KDM4E (0.40) ALDH1A1KDM4ELMNATSHR
SCHEMBL14065858 0.75 KDM4E (0.32) ALDH1A1KDM4ELMNA
SCHEMBL22263824 0.75 KDM4E (0.31) ALDH1A1KDM4ELMNA
SCHEMBL5357224 0.73 LMNA (0.37) ALDH1A1KDM4ELMNA
Ethylene SCHEMBL6270570 0.73 KDM4E (0.38) ALDH1A1KDM4ELMNATSHR
SCHEMBL4741820 0.72 ALDH1A1 (0.39) ALDH1A1KDM4ELMNA
SCHEMBL958078 0.71 KDM4E (0.37) ALDH1A1KDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2008140846-A1 HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-11-20 WO disclosed