SCHEMBL4754792

SCHEMBL4754792

CCCOC(=O)C1CC=CCC1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPM1B O75688 1/20 0.41
PTPN1 P18031 1/20 0.41
PPP1CC P36873 1/20 0.41
MIF P14174 1/20 0.40
ALDH1A1 P00352 3/20 0.36
MEN1 O00255 1/20 0.36
MAPT P10636 1/20 0.36
ALOX15 P16050 1/20 0.36
HTT P42858 1/20 0.36
KMT2A Q03164 1/20 0.36
ESR2 Q92731 1/20 0.36
HSD17B10 Q99714 1/20 0.36
TDP1 Q9NUW8 1/20 0.35
KDM4E B2RXH2 1/20 0.35
PKM P14618 1/20 0.35
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA7 P43166 1/20 0.33
CA9 Q16790 1/20 0.33
CA14 Q9ULX7 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9491308 0.91 MIF (0.37) PPM1BPTPN1PPP1CCMIFALDH1A1
SCHEMBL108178 0.90 ALDH1A1 (0.40) MIFALDH1A1MEN1MAPTALOX15
SCHEMBL11835168 0.89 MIF (0.44) MIFALDH1A1MEN1MAPTALOX15
SCHEMBL13649878 0.89 EPHX2 (0.40) MIFALDH1A1LMNA
SCHEMBL22036450 0.87 NAAA (0.42) ALDH1A1HTTLMNA
SCHEMBL13649884 0.87 NAAA (0.42) ALDH1A1HTTLMNA
SCHEMBL13649883 0.87 NAAA (0.42) ALDH1A1HTTLMNA
SCHEMBL29084231 0.86 MAPT (0.44) MIFALDH1A1MEN1MAPTALOX15
SCHEMBL472121 0.86 MAPT (0.44) MIFALDH1A1MEN1MAPTALOX15
SCHEMBL25648750 0.86 MAPT (0.44) MIFALDH1A1MEN1MAPTALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119639716-A Cyclohexenecarboxylesterase, mutant and application thereof in production of (S) -3-cyclohexene-1-carboxylic acid 浙江工业大学 2025-03-18 CN disclosed
US-7514204-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-04-07 US disclosed
US-20090011365-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-01-08 US disclosed
WO-2008106334-A2 FLAME RETARDED STYRENIC POLYMER FOAMS AND FOAM PRECURSORS ALBEMARLE CORPORATION (US) 2008-09-04 WO disclosed
US-20080096131-A1 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-04-24 US disclosed