Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.53 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.50 |
| ▸ | HRH3 | Q9Y5N1 | 3/20 | 0.46 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.46 |
| ▸ | HRH4 | Q9H3N8 | 1/20 | 0.45 |
| ▸ | AHR | P35869 | 1/20 | 0.43 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.41 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28990030 | 0.82 | KDM4E (0.51) | LOXL2HDAC8HRH3CHRNA7 | |
| SCHEMBL28551943 | 0.81 | LOXL2 (0.51) | LOXL2HDAC8HRH3CHRNA7HRH4 | |
| SCHEMBL26054231 | 0.75 | BCHE (0.53) | LOXL2HDAC8HRH3CHRNA7HRH4 | |
| SCHEMBL5770077 | 0.74 | GRIN2D (0.39) | HRH4MTNR1AMTNR1B | |
| SCHEMBL29403791 | 0.73 | LOXL2 (0.69) | LOXL2HRH3HRH4AHRMTNR1A | |
| SCHEMBL401081 | 0.73 | LOXL2 (0.69) | LOXL2HRH3HRH4AHRMTNR1A | |
| SCHEMBL28338445 | 0.73 | LOXL2 (0.69) | LOXL2HRH3HRH4AHRMTNR1A | |
| SCHEMBL7169246 | 0.73 | LOXL2 (0.69) | LOXL2HRH3CHRNA7HRH4AHR | |
| SCHEMBL31059889 | 0.73 | LOXL2 (0.69) | LOXL2HRH3CHRNA7HRH4AHR | |
| SCHEMBL2000625 | 0.72 | LOXL2 (0.53) | LOXL2HDAC8HRH3CHRNA7HRH4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0605937-B1 | Antistatic resin composition | DAISO CO LTD (JP) | 1997-06-11 | — | — | EP | claimed |
| EP-0605937-A1 | Antistatic resin composition | DAISO CO., LTD. (JP) | 1994-07-13 | — | — | EP | claimed |
| EP-3797991-B1 | PREPREG AND PRODUCTION METHOD THEREFOR, SLIT TAPE PREPREG, CARBON FIBER-REINFORCED COMPOSITE MATERIAL | TORAY INDUSTRIES (JP) | 2025-10-29 | — | — | EP | disclosed |
| US-12448510-B2 | Prepreg, method for producing same, and slit tape prepreg | TORAY INDUSTRIES, INC. (JP) | 2025-10-21 | — | — | US | disclosed |
| US-20240166798-A1 | EPOXY RESIN COMPOSITION, PREPREG, AND FIBER-REINFORCED COMPOSITE MATERIAL | TORAY INDUSTRIES, INC. (JP) | 2024-05-23 | — | — | US | disclosed |
| EP-4314108-A1 | EPOXY RESIN COMPOSITION, PREPREG, AND FIBER-REINFORCED COMPOSITE MATERIAL | Toray Industries, Inc. (JP) | 2024-02-07 | — | — | EP | disclosed |
| US-20230357561-A1 | PREPREG, METHOD FOR PRODUCING SAME, AND SLIT TAPE PREPREG | TORAY INDUSTRIES, INC. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-11708487-B2 | Prepreg, method for producing same, and slit tape prepreg | TORAY INDUSTRIES, INC. (JP) | 2023-07-25 | — | — | US | disclosed |
| WO-2022208165-A1 | EPOXY RESIN COMPOSITION, PREPREG, AND FIBER-REINFORCED COMPOSITE MATERIAL | TORAY INDUSTRIES, INC. (JP) | 2022-10-06 | — | — | WO | disclosed |
| EP-3312210-B1 | EPOXY RESIN COMPOSITION, PREPREG, AND FIBER-REINFORCED COMPOSITE MATERIAL | TORAY INDUSTRIES (JP) | 2022-03-30 | — | — | EP | disclosed |
| US-11286359-B2 | Prepreg and carbon fiber-reinforced composite material | TORAY INDUSTRIES, INC. (JP) | 2022-03-29 | — | — | US | disclosed |
| US-4499167-A | Photoconductive compositions comprising an organic photoconductor and an amide compound and electro-photographic light-sensitive materials using the compositions | FUJI PHOTO FILM CO., LTD. (JP) | 1985-02-12 | — | — | US | disclosed |
| US-4480020-A | Polymeric photoconductive sensitized by bis(β-cyano-β-alkoxycarbonylvinyl)benzene | FUJI PHOTO FILM CO., LTD. (JP) | 1984-10-30 | — | — | US | disclosed |
| US-4461821-A | Photoconductive compositions and electrophotographic photosensitive materials comprising an organic photoconductor and a thiourea compound | FUJI PHOTO FILM CO., LTD. (JP) | 1984-07-24 | — | — | US | disclosed |
| US-4448869-A | HYDROXY AND CARBOXY OR ACYL SUBSTITUTED BENZENE OR NAPHTHALENE | FUJI PHOTO FILM CO., LTD. (JP) | 1984-05-15 | — | — | US | disclosed |
| US-4447515-A | DIACYLAMINE COMPOUND ADDED | FUJI PHOTO FILM CO., LTD. (JP) | 1984-05-08 | — | — | US | disclosed |
| US-4444863-A | UREA COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1984-04-24 | — | — | US | disclosed |
| US-4389477-A | Photoconductive composition sensitized by a thiobarbituric acid derivative | FUJI PHOTO FILM CO., LTD. (JP) | 1983-06-21 | — | — | US | disclosed |
| US-4358521-A | ELECTROGRAPHY | FUJI PHOTO FILM CO., LTD. (JP) | 1982-11-09 | — | — | US | disclosed |
| US-4349618-A | 5-DIPHENYLMETHYLENE- OR 5-(FLUOREN-9-YLIDENE) THIOBARBITURIC ACID AND DERIVATIVES AS SENSITIZERS FOR N-VVINYLCARBAZOLE POLYMERS; ELECTROPHORESIS | FUJI PHOTO FILM CO., LTD. (JP) | 1982-09-14 | — | — | US | disclosed |