⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6402122 | 0.85 | ANPEP (0.31) | — | |
| SCHEMBL29066689 | 0.83 | — | — | |
| SCHEMBL29006514 | 0.78 | CA1 (0.41) | — | |
| SCHEMBL9927308 | 0.76 | MAOA (0.32) | — | |
| SCHEMBL6250870 | 0.74 | — | — | |
| SCHEMBL5800731 | 0.74 | ANPEP (0.31) | — | |
| SCHEMBL1265890 | 0.74 | — | — | |
| SCHEMBL25223032 | 0.73 | MEN1 (0.35) | — | |
| SCHEMBL17747945 | 0.73 | — | — | |
| Phosphine SCHEMBL6541978 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 133 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8114220-B2 | Co-solvent, chelating agent, optionally ion pairing reagent, and optionally surfactant, dense fluid; effectively removes photoresist and/or post-etch residue material from microelectronic device without substantially over-etching underlying silicon-containing layers and metallic interconnect material | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-02-14 | — | — | US | claimed |
| US-20080269096-A1 | Formulations for Cleaning Ion-Implanted Photoresist Layers from Microelectronic Devices | Advance Technology Materials, Inc. (US) | 2008-10-30 | — | — | US | claimed |
| EP-1879704-A2 | FORMULATIONS FOR CLEANING ION-IMPLANTED PHOTORESIST LAYERS FROM MICROELECTRONIC DEVICES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2008-01-23 | — | — | EP | claimed |
| WO-2006113621-A2 | FORMULATIONS FOR CLEANING ION-IMPLANTED PHOTORESIST LAYERS FROM MICROELECTRONIC DEVICES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2006-10-26 | — | — | WO | claimed |
| EP-1155057-B1 | IN MOLD ADDITION POLYMERIZATION OF NORBORNENE-TYPE MONOMERS USING GROUP 10 METAL COMPLEXES | SUMITOMO BAKELITE CO (JP) | 2005-06-22 | — | — | EP | claimed |
| EP-1034196-B1 | CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS | PROMERUS LLC (US) | 2005-01-12 | — | — | EP | claimed |
| US-20030120006-A1 | In mold addition polymerization of norbornene-type monomers using group 10 metal complexes | THE B.F. GOODRICH COMPANY | 2003-06-26 | — | — | US | claimed |
| US-20030023013-A1 | Catalyst and methods for polymerizing cycloolefins | THE B.F.GOODRICH COMPANY | 2003-01-30 | — | — | US | claimed |
| US-6455650-B1 | CONTACTING POLYCYCLOOLEFIN MONOMER WITH A HIGH ACTIVITY GROUP 10 TRANSITION METAL CATALYST COMPLEX TO OBTAIN POLYMER PRODUCT | THE B.F. GOODRICH COMPANY | 2002-09-24 | — | — | US | claimed |
| US-20020052454-A1 | CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS | SUMITOMO BAKELITE CO., LTD. (JP) | 2002-05-02 | — | — | US | claimed |
| US-6350832-B1 | CATALYTIC COSSLINKING POLYMER OF POLYCYCLOOLEFIN MONOMER, MOLDING AND SHAPING IN THE PRESENCE OF GROUP 10 TRANSITION METAL AND ANION | THE B. F. GOODRICH COMPANY | 2002-02-26 | — | — | US | claimed |
| EP-1155057-A1 | IN MOLD ADDITION POLYMERIZATION OF NORBORNENE-TYPE MONOMERS USING GROUP 10 METAL COMPLEXES | The B.F.Goodrich Co. (US) | 2001-11-21 | — | — | EP | claimed |
| EP-1034196-A1 | CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS | THE B.F. GOODRICH COMPANY (US) | 2000-09-13 | — | — | EP | claimed |
| WO-2000034344-A1 | IN MOLD ADDITION POLYMERIZATION OF NORBORNENE-TYPE MONOMERS USING GROUP 10 METAL COMPLEXES | THE B.F.GOODRICH COMPANY (US) | 2000-06-15 | — | — | WO | claimed |
| WO-2000020472-A1 | CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS | THE B.F. GOODRICH COMPANY (US) | 2000-04-13 | — | — | WO | claimed |
| EP-4613256-A1 | DENTAL ADHESIVE COMPOSITION | Kuraray Noritake Dental Inc. (JP) | 2025-09-10 | — | — | EP | disclosed |
| US-20250186309-A1 | DENTAL CURABLE COMPOSITION AND DENTAL KIT | KURARAY NORITAKE DENTAL INC. (JP) | 2025-06-12 | — | — | US | disclosed |
| EP-1034196-A1 | CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS | THE B.F. GOODRICH COMPANY (US) | 2000-09-13 | — | — | EP | disclosed |
| WO-2000034344-A1 | IN MOLD ADDITION POLYMERIZATION OF NORBORNENE-TYPE MONOMERS USING GROUP 10 METAL COMPLEXES | THE B.F.GOODRICH COMPANY (US) | 2000-06-15 | — | — | WO | disclosed |
| WO-2000020472-A1 | CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS | THE B.F. GOODRICH COMPANY (US) | 2000-04-13 | — | — | WO | disclosed |