Phosphine

Phosphine

SCHEMBL6541978

Fc1c(F)c(F)c(-c2cccc([Se]c3cccc(-c4c(F)c(F)c(F)c(F)c4F)c3-c3c(F)c(F)c(F)c(F)c3F)c2-c2c(F)c(F)c(F)c(F)c2F)c(F)c1F.P

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6402122 0.81 ANPEP (0.31) —
SCHEMBL29006514 0.75 CA1 (0.41) —
SCHEMBL476826 0.73 — —
SCHEMBL6250870 0.71 — —
SCHEMBL5800731 0.71 ANPEP (0.31) —
SCHEMBL1265890 0.71 — —
SCHEMBL25223032 0.70 MEN1 (0.35) —
SCHEMBL17747945 0.70 — —
SCHEMBL16355406 0.67 MAOA (0.36) —
SCHEMBL16127265 0.67 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6733959-B2 FOR FORMING VISIBLE IMAGE EASTMAN KODAK COMPANY 2004-05-11 — — US disclosed
US-6699647-B2 TELLURIUM CHEMICAL SENSITIZERS ADDED TO THE PHOTOTHERMOGRAPHIC EMULSION, FOR EXAMPLE TELLURIUM COMPLEXED WITH FOUR IMIDAZOLIDIN-2-THIONE GROUPS AND TWO CHLORINE ATOMS EASTMAN KODAK COMPANY 2004-03-02 — — US disclosed
US-20030073026-A1 Chemically sensitized aqueous-based photothermographic emulsions and materials and methods of using same EASTMAN KODAK COMPANY 2003-04-17 — — US disclosed
EP-1283441-A1 Chemically sensitized aqueous-based photothermographic emulsions and materials and methods of using same EASTMAN KODAK COMPANY (US) 2003-02-12 — — EP disclosed
EP-1272900-A2 HIGH SPEED PHOTOTHERMOGRAPHIC MATERIALS CONTAINING TELLURIUM COMPOUNDS AND METHODS OF USING SAME EASTMAN KODAK COMPANY (US) 2003-01-08 — — EP disclosed
US-20020164549-A1 High speed photothermographic materials containing tellurium compounds and methods of using same EASTMAN KODAK COMPANY 2002-11-07 — — US disclosed
WO-2002067053-A2 HIGH SPEED PHOTOTHERMOGRAPHIC MATERIALS CONTAINING TELLURIUM COMPOUNDS AND METHODS OF USING SAME EASTMAN KODAK COMPANY (US) 2002-08-29 — — WO disclosed
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