Formaldehyde

Formaldehyde

SCHEMBL4776726

C=O.O=C[SiH2]O[SiH3]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3262645 0.93
SCHEMBL8668054 0.65
SCHEMBL67972 0.65
Formaldehyde SCHEMBL5025876 0.62
SCHEMBL7137236 0.62
SCHEMBL303221 0.62
SCHEMBL8857941 0.62
SCHEMBL1999642 0.60
Hydrochloric Acid SCHEMBL6849656 0.60
Formaldehyde SCHEMBL14676197 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030196987-A1 Ultra fine patterning process for multi-layer substrate VIA TECHNOLOGIES, INC. (TW) 2003-10-23 US claimed
US-12155001-B2 Receiver with a light collector array and a mask for improving detection resolution during a scanning procedure of an optical sensing system BEIJING VOYAGER TECHNOLOGY CO., LTD. (CN) 2024-11-26 US disclosed
US-20230184903-A1 RECEIVER WITH A LIGHT COLLECTOR ARRAY AND A MASK FOR IMPROVING DETECTION RESOLUTION DURING A SCANNING PROCEDURE OF AN OPTICAL SENSING SYSTEM BEIJING VOYAGER TECHNOLOGY CO., LTD. (CN) 2023-06-15 US disclosed
US-9028704-B2 Magnetic recording medium and method of manufacturing KABUSHIKI KAISHA TOSHIBA (JP) 2015-05-12 US disclosed
US-20140002929-A1 MAGNETIC RECORDING MEDIUM AND METHOD OF MANUFACTURING KABUSHIKI KAISHA TOSHIBA (JP) 2014-01-02 US disclosed
US-8228657-B2 Frequency-addressable apparatus and methods for actuation of liquids UNIVERSITY OF ROCHESTER (US) 2012-07-24 US disclosed
WO-2008089244-A2 FREQUENCY-ADDRESSABLE APPARATUS AND METHODS FOR ACTUATION OF LIQUIDS UNIVERSITY OF ROCHESTER (US) 2008-07-24 WO disclosed
US-20080169195-A1 Frequency-addressable Apparatus and Methods for Actuation of Liquids UNIVERSITY OF ROCHESTER (US) 2008-07-17 US disclosed
CN-1212755-C patterning method of circuit substrate WEISHENG ELECT CO LTD (CN) 2005-07-27 CN disclosed
CN-1460000-A Patterning Process of Circuit Substrate WEISHENG ELECT CO LTD (CN) 2003-12-03 CN disclosed
US-20030196987-A1 Ultra fine patterning process for multi-layer substrate VIA TECHNOLOGIES, INC. (TW) 2003-10-23 US disclosed