SCHEMBL4779408

SCHEMBL4779408

O=C(O)c1ccc(CCc2cccc(OCCc3ccc(F)cc3)c2)o1

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
FFAR1 O14842 1/20 0.48
NR4A2 P43354 2/20 0.47
SIRT2 Q8IXJ6 3/20 0.46
SLC2A1 P11166 2/20 0.45
NPC1 O15118 2/20 0.45
RAB9A P51151 2/20 0.45
SLC2A4 P14672 2/20 0.45
SLC2A8 Q9NY64 1/20 0.45
NR4A1 P22736 1/20 0.44
NR4A3 Q92570 1/20 0.44
MAPT P10636 2/20 0.43
POLB P06746 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
SLC16A3 O15427 1/20 0.43
MAOA P21397 1/20 0.43
MAOB P27338 1/20 0.43
HSP90AA1 P07900 1/20 0.43
MRGPRX4 Q96LA9 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4726535 0.93 FFAR1 (0.46) FFAR1NR4A2SIRT2SLC2A1NPC1
SCHEMBL4725186 0.91 NR4A2 (0.60) FFAR1NR4A2NPC1RAB9AMAPT
SCHEMBL4725923 0.84 NR4A2 (0.57) FFAR1NR4A2NPC1RAB9AMAPT
SCHEMBL22610059 0.83 NR4A2 (0.47) FFAR1NR4A2SIRT2NPC1RAB9A
SCHEMBL27555763 0.82 TDP1 (0.56) FFAR1NR4A2NPC1RAB9ANR4A1
SCHEMBL1051817 0.80 POLB (0.50) FFAR1NR4A2NPC1RAB9AMAPT
SCHEMBL16703151 0.80 POLB (0.50) FFAR1NR4A2NPC1RAB9AMAPT
SCHEMBL4257586 0.80 AKR1C3 (0.49) NPC1RAB9APOLB
SCHEMBL4777687 0.78 KMT2A (0.49) NPC1RAB9AMAPTPOLBTDP1
SCHEMBL24401235 0.76 TDP1 (0.60) FFAR1NPC1RAB9AMAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2008016278-A1 FURAN-2-CARBOXYLIC ACID DERIVATIVES AND PROCESS FOR THE PREPARATION THEREOF KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) 2008-02-07 WO disclosed