⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL4846758 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL712965 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL1376347 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL3412516 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL2000641 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL27040595 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL28244231 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL831722 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL10323198 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL14762761 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 326 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117960979-A | Mould structure for prolonging service life of mould core | 联钢精密科技(中国)有限公司 | 2024-05-03 | — | — | CN | claimed |
| US-11942514-B2 | Semiconductor device | NANYA TECHNOLOGY CORPORATION (TW) | 2024-03-26 | — | — | US | claimed |
| US-11765882-B2 | Method for fabricating semiconductor device | NANYA TECHNOLOGY CORPORATION (TW) | 2023-09-19 | — | — | US | claimed |
| US-20230253210-A1 | SEMICONDUCTOR DEVICE WITH PROTECTION LAYER | NANYA TECHNOLOGY CORPORATION (TW) | 2023-08-10 | — | — | US | claimed |
| US-20230253209-A1 | SEMICONDUCTOR DEVICE WITH PROTECTION LAYER AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORPORATION (TW) | 2023-08-10 | — | — | US | claimed |
| US-20220059542-A1 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORPORATION (TW) | 2022-02-24 | — | — | US | claimed |
| US-11158795-B2 | Resistive switching memory with replacement metal electrode | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2021-10-26 | — | — | US | claimed |
| US-20210175236-A1 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | NANYA TECHNOLOGY CORPORATION (TW) | 2021-06-10 | — | — | US | claimed |
| US-20200263620-A1 | RESISTIVE SWITCHING MEMORY WITH REPLACEMENT METAL ELECTRODE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2020-08-20 | — | — | US | claimed |
| US-10727407-B2 | Resistive switching memory with replacement metal electrode | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-07-28 | — | — | US | claimed |
| US-20090236583-A1 | Method of fabricating a phase change memory and phase change memory | MARLIN SEMICONDUCTOR LIMITED (IE) | 2009-09-24 | — | — | US | claimed |
| US-7592657-B2 | Semiconductor device and method of manufacturing the same | FUJITSU MICROELECTRONICS LIMITED (JP) | 2009-09-22 | — | — | US | claimed |
| US-7550392-B2 | Semiconductor device and method of manufacturing the same | FUJITSU MICROELECTRONICS LIMITED (JP) | 2009-06-23 | — | — | US | claimed |
| CN-101429641-A | Chromium nitride, titanium nitride aluminum hard multi-layer nano-film coating | CHENGDU MINJIE MFG ENGINEERING (CN) | 2009-05-13 | — | — | CN | claimed |
| US-20080001254-A1 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2008-01-03 | — | — | US | claimed |
| CN-101068039-A | Structure and method for bistable resistance random access memory | MACRONIX INT CO LTD (CN) | 2007-11-07 | — | — | CN | claimed |
| US-20060281316-A1 | Semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2006-12-14 | — | — | US | claimed |
| US-5981416-A | SINTERING A POWDER CONTAINING TITANIUM ALUMINUM NITRIDE; USED AS CUTTING TOOL FOR HIGH SPEED CUTTING SPHEROIDAL GRAPHITE CAST IRON | NATIONAL INDUSTRIAL RESEARCH INSTITUTE OF NAGOYA (JP) | 1999-11-09 | — | — | US | claimed |
| US-5943600-A | Treatment of a titanium nitride layer to improve resistance to elevated temperatures | APPLIED MATERIALS, INC. (US) | 1999-08-24 | — | — | US | claimed |
| EP-0732731-A2 | Treatment of a titanium nitride layer to improve resistance to elevated temperatures | APPLIED MATERIALS, INC. (US) | 1996-09-18 | — | — | EP | claimed |