SCHEMBL4805354

SCHEMBL4805354

C=C(C(=O)O)c1ccc(-c2cccc(C)c2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HSD17B2 P37059 3/20 0.54
▸ HSD17B1 P14061 2/20 0.54
▸ MAPT P10636 2/20 0.53
▸ POLB P06746 1/20 0.53
▸ CTDSP1 Q9GZU7 1/20 0.53
▸ DHODH Q02127 3/20 0.48
▸ RXRA P19793 3/20 0.47
▸ RXRB P28702 3/20 0.47
▸ CNR2 P34972 2/20 0.47
▸ HDAC2 Q92769 1/20 0.46
▸ TRIM24 O15164 1/20 0.45
▸ TRIM33 Q9UPN9 1/20 0.45
▸ CNR1 P21554 1/20 0.44
▸ RXRG P48443 1/20 0.44
▸ BCL2 P10415 1/20 0.44
▸ PPARG P37231 1/20 0.44
▸ PPARA Q07869 1/20 0.44
▸ EPHX1 P07099 1/20 0.43
▸ AKR1C2 P52895 1/20 0.43
▸ AKR1C1 Q04828 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31425654 0.86 SMN1; SMN2 (0.50) MAPTCTDSP1RXRARXRBTRIM24
SCHEMBL31331712 0.82 RXRA (0.69) HSD17B2HSD17B1MAPTPOLBCTDSP1
SCHEMBL2610268 0.82 RXRA (0.69) HSD17B2HSD17B1MAPTPOLBCTDSP1
SCHEMBL4797412 0.82 ALDH1A1 (0.52) MAPTRXRARXRBSMN1; SMN2
SCHEMBL36308 0.82 SMN1; SMN2 (0.56) MAPTCTDSP1SMN1; SMN2
SCHEMBL1536312 0.80 PARP1 (0.57) MAPTPOLBCTDSP1SMN1; SMN2
SCHEMBL19026597 0.80 MAPT (0.44) HSD17B1MAPTCTDSP1RXRARXRB
SCHEMBL6019106 0.79 CNR2 (0.69) HSD17B2HSD17B1MAPTPOLBCTDSP1
SCHEMBL4428711 0.79 MAPT (0.64) HSD17B2HSD17B1MAPTPOLBCTDSP1
Bicarbonate SCHEMBL28836750 0.78 POLB (0.56) HSD17B2HSD17B1MAPTPOLBCTDSP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7416821-B2 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2008-08-26 — — US disclosed
EP-1743363-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FujiFilm Electronic Materials USA, Inc. (US) 2007-01-17 — — EP disclosed
US-20050238997-A1 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2005-10-27 — — US disclosed
WO-2005089150-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS USA INC. (US) 2005-09-29 — — WO disclosed
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