⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10336346 | 0.74 | ALDH1A1 (0.31) | — | |
| SCHEMBL17822676 | 0.72 | ALDH1A1 (0.34) | — | |
| SCHEMBL4787909 | 0.71 | GRM2 (0.31) | — | |
| SCHEMBL2996545 | 0.68 | — | — | |
| SCHEMBL635896 | 0.68 | ALDH1A1 (0.31) | — | |
| SCHEMBL4468948 | 0.67 | KMT2A (0.32) | — | |
| SCHEMBL110179 | 0.67 | HMGCR (0.33) | — | |
| SCHEMBL4907468 | 0.65 | ALDH1A1 (0.32) | — | |
| SCHEMBL28799371 | 0.65 | ALDH1A1 (0.32) | — | |
| SCHEMBL11757410 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9440326-B2 | Non-planar glass polishing pad and method of manufacture | JH RHODES COMPANY, INC. (US) | 2016-09-13 | — | — | US | disclosed |
| US-9050697-B2 | Self-conditioning polishing pad and a method of making the same | JH RHODES COMPANY, INC. (US) | 2015-06-09 | — | — | US | disclosed |
| WO-2014018170-A1 | NON-PLANAR GLASS POLISHING PAD AND METHOD OF MANUFACTURE | JH RHODES COMPANY, INC. (US) | 2014-01-30 | — | — | WO | disclosed |
| US-20140024296-A1 | NON-PLANAR GLASS POLISHING PAD AND METHOD OF MANUFACTURE | JH RHODES COMPANY, INC. | 2014-01-23 | — | — | US | disclosed |
| WO-2013142134-A1 | A SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME | JH RHODES COMPANY, INC. (US) | 2013-09-26 | — | — | WO | disclosed |
| US-20130252519-A1 | SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME | JH RHODES COMPANY, INC. (US) | 2013-09-26 | — | — | US | disclosed |
| WO-2012138705-A2 | A SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME | UNIVERSAL PHOTONICS, INC. (US) | 2012-10-11 | — | — | WO | disclosed |
| US-20080146129-A1 | Fast break-in polishing pad and a method of making the same | KOUZUMA MAKOTO | 2008-06-19 | — | — | US | disclosed |