SCHEMBL4812685

SCHEMBL4812685

CC(N(C)C)n1nnnc1S

nearest known ligand 0.30

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.30
POLB P06746 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7541204 0.79
SCHEMBL10811869 0.75 CYP1A2 (0.30) CYP1A2POLBCYP2C19
SCHEMBL7942980 0.74
SCHEMBL8016455 0.73
Hydrochloric Acid SCHEMBL11540755 0.72 ALDH1A1 (0.32) CYP1A2POLBCYP2C19
SCHEMBL11255061 0.71
SCHEMBL8313593 0.71
SCHEMBL11502636 0.68
Hydrochloric Acid SCHEMBL10837729 0.68 ALDH1A1 (0.33)
SCHEMBL18827428 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116554437-A Linear fluorine-containing glycidyl ether and preparation method and application thereof 哈尔滨工业大学 2023-08-08 CN claimed
CN-115725974-A Copper etching liquid composition 合肥中聚和成电子材料有限公司 2023-03-03 CN claimed
CN-111647889-A Copper etching solution with stable etching rate 湖北兴福电子材料有限公司 2020-09-11 CN claimed
JP-56135483-A None JP disclosed
JP-56135488-A None JP disclosed
CN-115554955-B Device and process for continuously producing N, N-dimethyl ethylenediamine 中建安装集团有限公司 2025-04-25 CN disclosed
CN-119663281-A Copper-molybdenum laminated etching liquid composition for panel and etching method 江阴江化微电子材料股份有限公司 2025-03-21 CN disclosed
CN-116554437-A Linear fluorine-containing glycidyl ether and preparation method and application thereof 哈尔滨工业大学 2023-08-08 CN disclosed
CN-110036341-B Photosensitive resin composition, photosensitive resin laminate, method for producing resin pattern, and method for producing cured film pattern 旭化成株式会社 2023-06-09 CN disclosed
CN-115725974-A Copper etching liquid composition 合肥中聚和成电子材料有限公司 2023-03-03 CN disclosed
WO-2023022148-A1 EPOXY RESIN COMPOSITION ナミックス株式会社 2023-02-23 WO disclosed
US-4464366-A Cephem compounds having a terminal aminocarboxylic acid grouping and containing an azacyclyl(thio)ureido group CIBA GEIGY CORPORATION (US) 1984-08-07 US disclosed
EP-0112283-A1 Heterocyclyl-thio compounds, process for their preparation, pharmaceutical compositions containing them and their use CIBA-GEIGY AG (CH) 1984-06-27 EP disclosed
US-4390535-A Antimicrobial 7-(α-acylamino-α-arylacetamido)-3-(substituted methyl)cephalosporin compounds SUMITOMO CHEMICAL COMPANY, LTD. (JP) 1983-06-28 US disclosed
EP-0059683-A2 7-Acylamido-3-cephem-4-carboxylic acids, process for their preparation, pharmaceutical compositions containing them and their use CIBA-GEIGY AG (CH) 1982-09-08 EP disclosed
JP-S56135483-A 2-AMINOTHIAZOL-4-YLACETIC 1-SUBSTITUTED-TETRAZOL-5-YL THIOL ESTER AND ITS PREPARATIVE METHOD ASAHI CHEM IND CO LTD 1981-10-22 JP disclosed
JP-S56135488-A NOVEL PREPARATIVE METHOD OF CEPHALOSPORANIC ACID DERIVATIVE ASAHI CHEM IND CO LTD 1981-10-22 JP disclosed
EP-0035413-A2 Antimicrobial 7-(alpha-acylamino-alpha-arylacetamido)-3-(substituted methyl)cephalosporin compounds, their compositions and production SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1981-09-09 EP disclosed
EP-0031794-A2 Cephalosporin derivatives, process for their preparation and pharmaceutical compositions containing them CIBA-GEIGY AG (CH) 1981-07-08 EP disclosed
US-4200575-A 7[(2-Thiazolyl)-2-(oxoimino)acetamido]cephalosporin derivatives TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1980-04-29 US disclosed