⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29501792 | 0.98 | CYP1A2 (0.31) | — | |
| SCHEMBL28707628 | 0.98 | CYP1A2 (0.31) | — | |
| SCHEMBL30868420 | 0.83 | CYP1A2 (0.30) | — | |
| SCHEMBL30868501 | 0.83 | CYP1A2 (0.30) | — | |
| SCHEMBL30868252 | 0.77 | MAP3K5 (0.33) | — | |
| SCHEMBL30868554 | 0.77 | MAP3K5 (0.33) | — | |
| Hydrochloric Acid SCHEMBL11540755 | 0.76 | ALDH1A1 (0.32) | — | |
| SCHEMBL829122 | 0.75 | ALDH1A1 (0.41) | — | |
| SCHEMBL4812685 | 0.74 | CYP1A2 (0.30) | — | |
| SCHEMBL11401506 | 0.74 | KDM4E (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120138738-A | Electronic plating cobalt additive composition for hole filling and application thereof | 厦门大学 | 2025-06-13 | — | — | CN | claimed |
| CN-118871861-A | Dry film resist, photosensitive dry film and copper-clad plate | 杭州福斯特电子材料有限公司 | 2024-10-29 | — | — | CN | claimed |
| WO-2023185530-A1 | DRY FILM RESIST, PHOTOSENSITIVE DRY FILM, AND COPPER CLAD LAMINATE | 杭州福斯特电子材料有限公司 | 2023-10-05 | — | — | WO | claimed |
| CN-114660895-A | Dry film resist, photosensitive dry film and copper-clad plate | 杭州福斯特电子材料有限公司 | 2022-06-24 | — | — | CN | claimed |
| CN-1238346-C | Method for producing 1-ethoxyl-5-mercapto-tetrazole | HUAFENG CHEMICAL CO LTD NANTON (CN) | 2006-01-25 | — | — | CN | claimed |
| CN-1562980-A | Method for producing 1-ethoxyl-5-mercapto-tetrazole | HUAFENG CHEMICAL CO LTD NANTON (CN) | 2005-01-12 | — | — | CN | claimed |
| US-4508909-A | Synthesis of hydroxyethyltetrazolethiol and etherified intermediates therefor | SHIONOGI & CO., LTD. (JP) | 1985-04-02 | — | — | US | claimed |
| JP-60258176-A | — | — | None | — | — | JP | disclosed |
| JP-60258177-A | — | — | None | — | — | JP | disclosed |
| CN-120138738-A | Electronic plating cobalt additive composition for hole filling and application thereof | 厦门大学 | 2025-06-13 | — | — | CN | disclosed |
| CN-116396234-B | Nitromethane tail gas recycling treatment method | 湖北富博化工有限责任公司 | 2025-03-14 | — | — | CN | disclosed |
| CN-116396233-B | Preparation method and application of compound | 湖北富博化工有限责任公司 | 2025-03-14 | — | — | CN | disclosed |
| CN-118871861-A | Dry film resist, photosensitive dry film and copper-clad plate | 杭州福斯特电子材料有限公司 | 2024-10-29 | — | — | CN | disclosed |
| US-6297000-B1 | IMAGING LAYERS WITH SILVER SALT, REDUCING AGENT AND BINDERS WITH UNSATURATED COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-10-02 | — | — | US | disclosed |
| JP-S60258177-A | PREPARATION OF BENZYL TETRAHYDROPYRAN-2-OXYETHYL-DITHIOCARBAMATE | TOYO KASEI KOGYO KK | 1985-12-20 | — | — | JP | disclosed |
| JP-S60258176-A | BENZYL TETRAHYDROPYRAN-2-OXYETHYL-DITHIOCARBAMATE COMPOUND | TOYO KASEI KOGYO KK | 1985-12-20 | — | — | JP | disclosed |
| US-4508909-A | Synthesis of hydroxyethyltetrazolethiol and etherified intermediates therefor | SHIONOGI & CO., LTD. (JP) | 1985-04-02 | — | — | US | disclosed |
| US-4508909-A | Synthesis of hydroxyethyltetrazolethiol and etherified intermediates therefor | SHIONOGI & CO., LTD. (JP) | 1985-04-02 | — | — | US | disclosed |
| US-4385178-A | REACTION OF A CEPHALOSPORANIC ACID WITH A THIOL COMPOUND IN THE PRESENCE OF BORON TRIFLUORIDE | TOYAMA CHEMICAL CO., LTD. (JP) | 1983-05-24 | — | — | US | disclosed |
| US-4317907-A | ANHYDROUS CONDITIONS IN THE PRESENCE OF BOREN TRIFLUORIDE OR ONE OF ITS COMPLEXES | TOYAMA CHEMICAL CO., LTD. (JP) | 1982-03-02 | — | — | US | disclosed |