Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.30 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.30 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685738 | 0.74 | KDM4E (0.30) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL10244020 | 0.72 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL10064059 | 0.70 | CYP3A4 (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL685126 | 0.70 | — | — | |
| SCHEMBL1320977 | 0.69 | — | — | |
| SCHEMBL4822313 | 0.68 | — | — | |
| SCHEMBL10242702 | 0.68 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL169869 | 0.68 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL685824 | 0.68 | KDM4E (0.30) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL18270550 | 0.68 | KDM4E (0.34) | KDM4ENPC1POLBMAPTPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7407733-B2 | Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.04,8] nonan-3-one ring and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2008-08-05 | — | — | US | disclosed |
| US-20060281022-A1 | Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0 4.8] nonan-3-one ring and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-12-14 | — | — | US | disclosed |