Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL169869 | 0.80 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL10242702 | 0.80 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL172034 | 0.72 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL10244269 | 0.72 | ICAM1 (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL4813727 | 0.72 | KDM4E (0.33) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL16784705 | 0.69 | ALDH1A1 (0.30) | — | |
| SCHEMBL13383461 | 0.69 | — | — | |
| SCHEMBL10064059 | 0.67 | CYP3A4 (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL685969 | 0.67 | KDM4E (0.33) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL19954374 | 0.67 | KDM4E (0.33) | KDM4ENPC1POLBMAPTPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2450746-A1 | Positive resist composition and pattern forming method using the composition | Fujifilm Corporation (JP) | 2012-05-09 | — | — | EP | disclosed |
| EP-2177506-A1 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND USED IN THE COMPOSITION | Fujifilm Corporation (JP) | 2010-04-21 | — | — | EP | disclosed |