Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Benzil. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 14/20 | 0.82 |
| ▸ | CES1 | P23141 | 13/20 | 0.82 |
| ▸ | RAB9A | P51151 | 1/20 | 0.60 |
| ▸ | TSHR | P16473 | 2/20 | 0.55 |
| ▸ | DAO | P14920 | 1/20 | 0.55 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.55 |
| ▸ | LMNA | P02545 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
| ▸ | XBP1 | P17861 | 1/20 | 0.54 |
| ▸ | ATM | Q13315 | 1/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.54 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzil SCHEMBL2252919 | 0.94 | CES2 (0.82) | CES2CES1RAB9ATSHRDAO | |
| Benzil SCHEMBL1481339 | 0.92 | CES2 (0.80) | CES2CES1RAB9ATSHRDAO | |
| Benzil SCHEMBL4832229 | 0.91 | CES2 (0.88) | CES2CES1RAB9ATSHRDAO | |
| Benzil SCHEMBL27655380 | 0.91 | CES2 (0.88) | CES2CES1RAB9ATSHRDAO | |
| Benzil SCHEMBL66 | 0.91 | CES2 (1.00) | CES2CES1RAB9ATSHRDAO | |
| Benzil SCHEMBL2156589 | 0.91 | CES2 (1.00) | CES2CES1RAB9ATSHRDAO | |
| Benzil SCHEMBL9517636 | 0.91 | CES2 (1.00) | CES2CES1RAB9ATSHRDAO | |
| Benzil SCHEMBL28475956 | 0.91 | CES2 (1.00) | CES2CES1RAB9ATSHRDAO | |
| Benzil SCHEMBL7142843 | 0.91 | CES2 (1.00) | CES2CES1RAB9ATSHRDAO | |
| Benzil SCHEMBL6753094 | 0.89 | CES2 (0.74) | CES2CES1RAB9ATSHRDAO |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250109249-A1 | Polyimide Resin, Resin Composition Containing Said Polyimide Resin, and Cured Product Thereof | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2025-04-03 | — | — | US | disclosed |
| US-12247104-B2 | Polyamic acid resin, polyimide resin, and resin composition including these | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2025-03-11 | — | — | US | disclosed |
| US-20240343865-A1 | Polyimide Resin, Resin Composition Comprising Polyimide Resin and Cured Product Thereof | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2024-10-17 | — | — | US | disclosed |
| CN-117924626-A | Block copolymer composition and method for producing the same | 科腾聚合物荷兰有限责任公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-117015586-A | Aerosol raw material composition, aerosol composition and aerosol product | ＡＧＣ株式会社 | 2023-11-07 | — | — | CN | disclosed |
| US-20220169791-A1 | Polyamic Acid Resin, Polyimide Resin, and Resin Composition Including These | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2022-06-02 | — | — | US | disclosed |
| US-7405459-B2 | Semiconductor device comprising porous film | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2008-07-29 | — | — | US | disclosed |
| US-20080118737-A1 | excels in dielectric properties, adhesion, film consistency, mechanical strength, easily thinned; made from an amorphous polymer made by hydrolyzing and condensing an silane compoundl, and and a zeolite sol made with a quaternary ammonium hydroxide | SHIN-ETSU CHEMICAL CO. LTD. | 2008-05-22 | — | — | US | disclosed |
| US-7309722-B2 | excels in dielectric properties, adhesion, film consistency, mechanical strength, easily thinned; made from an amorphous polymer made by hydrolyzing and condensing an silane compoundl, and and a zeolite sol made with a quaternary ammonium hydroxide | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2007-12-18 | — | — | US | disclosed |
| US-7244657-B2 | Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2007-07-17 | — | — | US | disclosed |
| US-20070108593-A1 | Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | OGIHARA TSUTOMU | 2007-05-17 | — | — | US | disclosed |
| US-20040105986-A1 | excels in dielectric properties, adhesion, film consistency, mechanical strength, easily thinned; made from an amorphous polymer made by hydrolyzing and condensing an silane compoundl, and and a zeolite sol made with a quaternary ammonium hydroxide | PANASONIC CORPORATION (JP) | 2004-06-03 | — | — | US | disclosed |
| US-20040091419-A1 | Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2004-05-13 | — | — | US | disclosed |
| EP-0051320-B1 | RADIATION-SENSITIVE NEGATIVE RESIST | NEC CORPORATION (JP) | 1986-06-04 | — | — | EP | disclosed |
| US-4592993-A | Selectively exposure radiation sensitive polymer to radiation; developing; dry etching | NIPPON ELECTRIC CO., LTD. (JP) | 1986-06-03 | — | — | US | disclosed |
| EP-0051320-A2 | Radiation-sensitive negative resist | NEC CORPORATION (JP) | 1982-05-12 | — | — | EP | disclosed |